A GPU-based full-chip inverse lithography solution for random patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7641, Issue , 2010, Pages

  Torunoglu, Ilhami ^a   Karakas, Ahmet ^a   Elsen, Erich ^a   Andrus, Curtis ^a   Bremen, Brandon ^a   Dimitrov, Boris ^a   Ungar, Jeffrey ^a  

^a Gauda Inc   (United States)

Author keywords

Computational lithography; Feedback control; Full chip; Graphics processors; Inverse lithography; Optimization

Indexed keywords

COMPUTATIONAL LITHOGRAPHY; COMPUTATIONAL REQUIREMENTS; GRAPHIC PROCESSORS; GRAPHICS PROCESSOR; GRAPHICS PROCESSORS; INVERSE LITHOGRAPHY; MANUFACTURABILITY; MANUFACTURING PROCESS; MODELING AND SIMULATION; OPTIMIZATION APPROACH; PROCESS WINDOW; RANDOM PATTERN;

COMPUTER SIMULATION; FEEDBACK CONTROL; INDUSTRIAL APPLICATIONS; MACHINE DESIGN; OPTIMIZATION; PROGRAM PROCESSORS;

LITHOGRAPHY;

EID: 77953280459     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846638     Document Type: Conference Paper

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