Separable OPC models for computational lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Liu, Hua Yu ^a   Zhao, Qian ^a   Fung Chen, J ^a   Jiang, Jiong ^a   Socha, Robert ^a   Van Setten, Eelco ^b   Engelen, Andre ^b   Meessen, Jeroen ^b   Crouse, Michael M ^a   Feng, Mu ^a   Shao, Wenjin ^a   Cao, Hua ^a   Cao, Yu ^a   Van Look, Lieve ^c   Bekaert, Joost ^c   Vandenberghe, Geert ^c   Finders, Jo ^b  

^a ASML US Inc   (United States)

^b ASML   (Netherlands)

^c IMEC   (Belgium)

Author keywords

3D mask models; OPC; OPC model; Optical proximity correction; Separable models

Indexed keywords

CADMIUM; CADMIUM COMPOUNDS; COMPUTER NETWORKS; EXPOSURE METERS; FINITE ELEMENT METHOD; FORECASTING; LITHOGRAPHY; MANUFACTURE; MATERIALS SCIENCE; MATHEMATICAL MODELS; OPTICS; PHOTOMASKS; PHOTONICS; SEMICONDUCTING CADMIUM COMPOUNDS; SPECIFICATIONS; TECHNOLOGY; TOOLS;

CALIBRATION ACCURACY; CD UNIFORMITY (CDU); EXPERIMENTAL DATA; EXPOSURE MODELING; EXPOSURE TOOLS; ILLUMINATION SOURCES; IMAGING TOOLS; IN ORDER; LUMPED MODELING; MASK TECHNOLOGY; MULTIPLE SETS; NEXT-GENERATION LITHOGRAPHY (NGL); OPC MODELING; OPTICAL (PET) (OPET); PHOTO MASKING; PREDICTION ACCURACY; PROCESS WINDOWS; RESIST MODELS; SEMICONDUCTOR MANUFACTURING; WAFER PRINTING;

THREE DIMENSIONAL;

EID: 45549104490     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793039     Document Type: Conference Paper

References (7)

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2. J. Fung Chen, Hua-yu Liu, Tom Laidig, Christian Zuniga, Yu Cao, Robert Socha, "Development of a computational lithography roadmap" Proc. SPIE 6924, (2008), to be published
3. Hua-Yu Liu, Jiong Jiang, Qian Zhao, J. Fung Chen, Robert Socha, Jo Finders, "OPC model separability speeds computational lithography", Solid State Technology Magazine, April 2008
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7. Peng Liu, Yu Cao, Luoqi Chen, Guangqing Chen, Mu Feng, Jiong Jiang, Hua-yu Liu, Sungsoo Suh, Sung-Woo Lee, and Sukjoo Lee, "Fast and accurate 3D mask model for full-chip OPC and verification," Proc. SPIE 6520 (2007)