Modeling of electromagnetic effects from mask topography at full-chip scale

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 498-505

  Adam, Konstantinos ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Domain decomposition method; Optical proximity correction

Indexed keywords

DOMAIN DECOMPOSITION METHOD; MASK TOPOGRAPHY; OPTICAL PROXIMITY CORRECTION;

COMPUTER SIMULATION; LIGHT POLARIZATION; MASKS; MATHEMATICAL MODELS; MAXWELL EQUATIONS; PHOTOLITHOGRAPHY;

MAGNETOELECTRIC EFFECTS;

EID: 25144483790     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600139     Document Type: Conference Paper

References (9)

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2. K. Adam, Domain Decomposition Methods for the Electromagnetic Simulation of Scattering from Three-Dimensional Structures with Applications in Lithography, Electronics Research Laboratory, University of California, Berkeley, chapter 4, 2001.
3. ibid., chapter 6
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7. T. Pistor, Expanding the Simulation Capability of TEMPEST, Electronic Research Laboratory, University of California, Berkeley, 1997.
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9. H. H. Hopkins, "On the Diffraction Theory of Optical Images", Proc. Roy. Soc. A217, pp. 408-432, 1953.