Photomasks and the enablement of circuit design complexity

Proceedings of the 11th International Symposium on Quality Electronic Design, ISQED 2010

Volumn , Issue , 2010, Pages 103-107

  Buck, Peter ^a   Kalk, Franklin ^a   West, Craig ^a  

^a Toppan Photomasks Inc   (United States)

Author keywords

Mask; Photomask

Indexed keywords

CAPITAL INVESTMENT; CIRCUIT DESIGNS; COST EFFICIENCY; COST PERFORMANCE; DESIGN COSTS; DESIGN INTENT; DESIGN LAYOUT; MOORE'S LAW; PRODUCT NODE; REPLICATORS; SEMICONDUCTOR INDUSTRY; SUB-WAVELENGTH;

COSTS; DESIGN; FORECASTING; INVESTMENTS; LITHOGRAPHY; OPTOELECTRONIC DEVICES; SEMICONDUCTOR DEVICE MANUFACTURE;

PHOTOMASKS;

EID: 77952595717     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISQED.2010.5450555     Document Type: Conference Paper

References (8)

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3. Spence, et al., "Mask data volume: explosion or damp squib?" Proc. SPIE 5992, 599211 (2005)
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5. Rosenbluth et al., "Experimental Result and Simulation Analysis for the use of Pixelated Illumination from Source Mask Optimization for 22nm Logic Lithography Process", SPIE Advanced Lithography, Vol. 7274 (2009)
6. Vol. 18, No. 7, IBS report, July 2009. "GLOBAL SYSTEM IC (ASSP/ASIC) SERVICE MANAGEMENT REPORT"
7. Hughes, Yun, "Mask industry assessment: 2009", Proc. SPIE Vol. 7488, 748803 (Sep. 29, 2009)
8. www.semiconductor.net, 1 Jan 2010, interview with Dr. Franklin Kalk, Toppan, "2010 Executive Outlook: Cautious Optimism Emerges"