Applicability of global source mask optimization to 22/20nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7973, Issue , 2011, Pages

  Tian, Kehan ^a   Fakhry, Moutaz ^b   Dave, Aasutosh ^b   Tritchkov, Alexander ^b   Tirapu Azpiroz, Jaione ^a   Rosenbluth, Alan E ^c   Melville, David ^c   Sakamoto, Masaharu ^d   Inoue, Tadanobu ^d   Mansfield, Scott ^a   Wei, Alexander ^a   Kim, Young ^a   Durgan, Bruce ^b   Adam, Kostas ^b   Berger, Gabriel ^b   Bhatara, Gandharv ^b   Meiring, Jason ^a   Haffner, Henning ^e   Kim, Byung Sung ^f  

^a IBM RESEARCH   (United States)

^b MENTOR GRAPHICS CORPORATION   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

^d IBM RESEARCH TOKYO   (Japan)

^e INFINEON TECHNOLOGIES   (United States)

^f SAMSUNG Electronics   (South Korea)

Author keywords

Global optimization; Mask optimization; Optical proximity correction (opc); Pixelated illumination; Programmable illumination; Resolution enhancement techniques (rets); Source mask optimization (smo); Source optimization

Indexed keywords

MASK OPTIMIZATION; OPTICAL PROXIMITY CORRECTIONS; PIXELATED ILLUMINATION; PROGRAMMABLE ILLUMINATION; RESOLUTION ENHANCEMENT TECHNIQUES (RETS); SOURCE MASK OPTIMIZATION (SMO); SOURCE OPTIMIZATION;

GLOBAL OPTIMIZATION; MASKS; NANOTECHNOLOGY; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY;

OPTIMIZATION;

EID: 79959280601     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879703     Document Type: Conference Paper

References (9)

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