Incorporating mask topography edge diffraction in photolithography simulations

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 23, Issue 4, 2006, Pages 821-828

  Tirapu Azpiroz, Jaione ^a   Yablonovitch, Eli ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; DIFFRACTION; EDGE DETECTION; MASKS; OPTICAL PARAMETRIC OSCILLATORS;

EDGE DIFFRACTION; MASK TOPOGRAPHY; PHOTOLITHOGRAPHY SIMULATIONS;

PHOTOLITHOGRAPHY;

EID: 33744798736     PISSN: 10847529     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAA.23.000821     Document Type: Article

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