Through-process modeling for design-for-manufacturability applications

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 6, Issue 3, 2007, Pages

  Mansfield, Scott ^a   Han, Geng ^a   Liebmann, Lars ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Design for manufacturability; Integrated circuits; Resolution; Semiconductors; Through process modeling

Indexed keywords

INTEGRATED CIRCUITS; LITHOGRAPHY; MATHEMATICAL MODELS; SEMICONDUCTOR MATERIALS;

DESIGN FOR MANUFACTURABILITY; THROUGH PROCESS MODELING;

SYSTEMS ANALYSIS;

EID: 40049098822     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2774987     Document Type: Article

References (17)