Considerations for cost of ownership in EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Keen, Anthony ^a   Bailey, Christopher ^a   Donders, Jos ^a   Condon, Neil ^a  

^a BOC Edwards   (United Kingdom)

Author keywords

cost of ownership; EUVL; green mode; integrated systems; vacuum equipment

Indexed keywords

COST OF OWNERSHIP; EUVL; GREEN MODE; INTEGRATED SYSTEMS; VACUUM EQUIPMENT;

COSTS; MANUFACTURE; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; VACUUM; VACUUM TECHNOLOGY;

EQUIPMENT;

EID: 79957930148     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.894707     Document Type: Conference Paper

References (2)

1. "Strategies for energy reduction in semiconductor manufacturing" Solid State Technology, volume 51, issue 10 (2008).
2. Quisenberry, J., Fenstermaker, K., "Summary Facilities Energy Consumption in 200 and 300mm Fabs" ISMI Technical Transfer Publication #08024920A-TR, (2008).