Source optimization for image fidelity and throughput

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 4, 2004, Pages 509-522

  Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Microlithography; Off axis illumination; Optical proximity correction; RET; Source optimization

Indexed keywords

OFF-AXIS ILLUMINATION; OPTICAL PROXIMITY CORRECTIONS; RET; SOURCE OPTIMIZATION;

CONSTRAINT THEORY; DIFFRACTIVE OPTICS; ILLUMINATING ENGINEERING; LEAST SQUARES APPROXIMATIONS; LIGHT MODULATION; LITHOGRAPHY; OPTIMIZATION; PHASE SHIFT; PROBLEM SOLVING;

IMAGE ANALYSIS;

ILLUMINATION; IMAGE ANALYSIS; LITHOGRAPHY; OPTICS; OPTIMIZATION;

EID: 2942650406     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1794708     Document Type: Review

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