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Volumn 7140, Issue , 2008, Pages

An innovative source-mask co-optimization (SMO) method for extending low k1 imaging

Author keywords

Co optimization; Continuous transmission mask (CTM); Cost function; Diffraction optical element (DOE); Edge placement error (EPE); Freeform source; Illuminator; Low k1; Mask

Indexed keywords

CO-OPTIMIZATION; CONTINUOUS TRANSMISSION MASK (CTM); DIFFRACTION OPTICAL ELEMENT (DOE); EDGE PLACEMENT ERROR (EPE); FREEFORM SOURCE; ILLUMINATOR; LOW K1;

EID: 62449227890     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.806657     Document Type: Conference Paper
Times cited : (65)

References (5)
  • 1
    • 0035758402 scopus 로고    scopus 로고
    • Optimum mask and source patterns to print a given shape
    • Alan E. Rosenbluth, et al., Optimum mask and source patterns to print a given shape, SPIE Vol. 4346, 2001, pp 486-502
    • (2001) SPIE , vol.4346 , pp. 486-502
    • Rosenbluth, A.E.1
  • 2
    • 28544444163 scopus 로고    scopus 로고
    • Simultaneous source mask optimization (SMO)
    • Robert Socha, et al., Simultaneous source mask optimization (SMO), SPIE Vol. 5853, 2005, pp 180-193
    • (2005) SPIE , vol.5853 , pp. 180-193
    • Socha, R.1
  • 3
    • 84888490282 scopus 로고    scopus 로고
    • Integration Technology of 30nm Generation Multi-Level NAND for 64G DRAM
    • Donghwa Kwak, et al., Integration Technology of 30nm Generation Multi-Level NAND for 64G DRAM, 2007 Symposium on VLSI Technology Digest
    • (2007) Symposium on VLSI Technology Digest
    • Kwak, D.1
  • 4
    • 62449195243 scopus 로고    scopus 로고
    • August
    • Nikkei Microdevices, August 2008, pp 94-95
    • (2008) Nikkei Microdevices , pp. 94-95


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.