SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Annual Review of Physical Chemistry

Volumn 54, Issue , 2003, Pages 277-305

Optical Diagnostics for Thin Film Processing

(1) Herman, Irving P a

a Columbia University ^* (United States)

Author keywords

Ellipsometry; Epitaxy; Plasma etching; Reflectometry; Surfaces; Thermometry

Indexed keywords

COMPOSITION; ELLIPSOMETRY; PLASMA ETCHING; PLASMA PROBES; SUBSTRATES;

OPTICAL DIAGNOSTICS;

THIN FILMS;

EID: 0042781981 PISSN: 0066426X EISSN: None Source Type: Book Series
DOI: 10.1146/annurev.physchem.54.011002.103824 Document Type: Article

Times cited : (23)

References (275)

1
- 0003840268
- San Diego: Academic
- Herman IP. 1996. Optical Diagnostics for Thin Film Processing. San Diego: Academic
- (1996) Optical Diagnostics for Thin Film Processing
- Herman, I.P.¹

2
- 17544402622
- Aspnes DE, Dietz N. 1998. Appl. Surf. Sci. 132:367-76
- (1998) Appl. Surf. Sci. , vol.132 , pp. 367-376
- Aspnes, D.E.¹ Dietz, N.²

3
- 0029491634
- Herman IP. 1995. IEEE J. Sel. Top. Quantum Electron. 1:1047-53
- (1995) IEEE J. Sel. Top. Quantum Electron. , vol.1 , pp. 1047-1053
- Herman, I.P.¹

4
- 0034325420
- Edgar TF, Butler SW, Campbell WJ, Pfeiffer C, Bode C, et al. 2000. Automatica 36:1567-603
- (2000) Automatica , vol.36 , pp. 1567-1603
- Edgar, T.F.¹ Butler, S.W.² Campbell, W.J.³ Pfeiffer, C.⁴ Bode, C.⁵

5
- 0035399112
- Wang G, Ren G, Le L, Lee HP, Pinsukanjana P, et al. 2001. J. Cryst. Growth 227:238-43
- (2001) J. Cryst. Growth , vol.227 , pp. 238-243
- Wang, G.¹ Ren, G.² Le, L.³ Lee, H.P.⁴ Pinsukanjana, P.⁵

6
- 0036671840
- Donnelly VM, Malyshev MV, Schabel M, Kornblit A, Tai W, et al. 2002. Plasma Sources Sci. Technol. 11:A26-30
- (2002) Plasma Sources Sci. Technol. , vol.11
- Donnelly, V.M.¹ Malyshev, M.V.² Schabel, M.³ Kornblit, A.⁴ Tai, W.⁵

7
- 0000296747
- Chen RW, Huang H, Spanos CJ, Gatto M. 1996. J. Vac. Sci. Technol. A 14:1901-6
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 1901-1906
- Chen, R.W.¹ Huang, H.² Spanos, C.J.³ Gatto, M.⁴

8
- 0034225563
- Kim SB, Lee YH, Kim TH, Yeom GY, Kim CI. 2000. J. Vac. Sci. Technol. A 18:1381-84
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 1381-1384
- Kim, S.B.¹ Lee, Y.H.² Kim, T.H.³ Yeom, G.Y.⁴ Kim, C.I.⁵

9
- 0035440968
- Kobayashi T, Sasama T, Wada H, Fujii N. 2001. J. Vac. Sci. Technol. A 19:2155-62
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 2155-2162
- Kobayashi, T.¹ Sasama, T.² Wada, H.³ Fujii, N.⁴

10
- 0035508013
- Cho BO, Lao S, Sha L, Chang JP. 2001. J. Vac. Sci. Technol. A 19:2751-61
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 2751-2761
- Cho, B.O.¹ Lao, S.² Sha, L.³ Chang, J.P.⁴

11
- 0033456545
- Martin N, Rousselot C, 1999. J. Vac. Sci. Technol. A 17:2869-78
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2869-2878
- Martin, N.¹ Rousselot, C.²

12
- 0034338316
- Willmott PR, Huber JR. 2000. Rev. Mod. Phys. 72:315-28
- (2000) Rev. Mod. Phys. , vol.72 , pp. 315-328
- Willmott, P.R.¹ Huber, J.R.²

13
- 0036164589
- Ostrikov KN, Xu S, Azam A. 2002. J. Vac. Sci. Technol. A 20:251-64
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 251-264
- Ostrikov, K.N.¹ Xu, S.² Azam, A.³

14
- 0008191949
- Donnelly VM, Malyshev MV. 2000. Appl. Phys. Lett. 77:2467-69
- (2000) Appl. Phys. Lett. , vol.77 , pp. 2467-2469
- Donnelly, V.M.¹ Malyshev, M.V.²

15
- 0347131171
- Malyshev MV, Donnelly VM. 1997. J. Vac. Sci. Technol. A 15:550-58
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 550-558
- Malyshev, M.V.¹ Donnelly, V.M.²

16
- 0000251646
- Malyshev MV, Donnelly VM. 1999. Phys. Rev. E 60:6016-29
- (1999) Phys. Rev. E , vol.60 , pp. 6016-6029
- Malyshev, M.V.¹ Donnelly, V.M.²

17
- 0000899436
- Malyshev MV, Donnelly VM. 2000. J. Appl. Phys. 87:1642-49
- (2000) J. Appl. Phys. , vol.87 , pp. 1642-1649
- Malyshev, M.V.¹ Donnelly, V.M.²

18
- 0037094904
- Donnelly VM, Schabel MJ. 2002. J. Appl. Phys. 91:6288-95
- (2002) J. Appl. Phys. , vol.91 , pp. 6288-6295
- Donnelly, V.M.¹ Schabel, M.J.²

19
- 0034187934
- Malyshev MV, Donnelly VM, Downey SW, Colonell JL, Layadi N. 2000. J. Vac. Sci. Technol. A 18:849-59
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 849-859
- Malyshev, M.V.¹ Donnelly, V.M.² Downey, S.W.³ Colonell, J.L.⁴ Layadi, N.⁵

20
- 0003730831
- New York: Wiley
- Lieberman M, Lichtenberg A. 1994. Principles of Plasma Discharges and Materials Processing. New York: Wiley
- (1994) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.¹ Lichtenberg, A.²

21
- 0036162521
- Fuller NCM, Donnelly VM, Herman IP. 2002. J. Vac. Sci. Technol. A 20:170-73
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 170-173
- Fuller, N.C.M.¹ Donnelly, V.M.² Herman, I.P.³

22
- 0036160381
- Hancock G, Sucksmith JP. 2002. J. Vac. Sci. Technol. A 20:270-77
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 270-277
- Hancock, G.¹ Sucksmith, J.P.²

23
- 0033743121
- Fuller NCM, Malyshev MV, Donnelly VM, Herman IP. 2000. Plasma Sources Sci. Technol. 9:116-27
- (2000) Plasma Sources Sci. Technol. , vol.9 , pp. 116-127
- Fuller, N.C.M.¹ Malyshev, M.V.² Donnelly, V.M.³ Herman, I.P.⁴

24
- 0034227943
- Tang XM, Manos DM. 2000. J. Vac. Sci. Technol. A 18:1359-65
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 1359-1365
- Tang, X.M.¹ Manos, D.M.²

25
- 0033308649
- Hanish CK, Grizzle JW, Terry FL. 1999. IEEE Trans. Semicond. Manuf. 12:323-31
- (1999) IEEE Trans. Semicond. Manuf. , vol.12 , pp. 323-331
- Hanish, C.K.¹ Grizzle, J.W.² Terry, F.L.³

26
- 0000899437
- Malyshev MV, Donnelly VM. 2000. J. Appl. Phys. 88:6207-15
- (2000) J. Appl. Phys. , vol.88 , pp. 6207-6215
- Malyshev, M.V.¹ Donnelly, V.M.²

27
- 0000475425
- Malyshev MV, Donnelly VM, Kornblit A, Ciampa NA. 1998. J. Appl. Phys. 84:137-46
- (1998) J. Appl. Phys. , vol.84 , pp. 137-146
- Malyshev, M.V.¹ Donnelly, V.M.² Kornblit, A.³ Ciampa, N.A.⁴

28
- 0001555452
- Malyshev MV, Donnelly VM, Samukawa S. 1998. J. Appl. Phys. 84:1222-30
- (1998) J. Appl. Phys. , vol.84 , pp. 1222-1230
- Malyshev, M.V.¹ Donnelly, V.M.² Samukawa, S.³

29
- 0034272568
- Franz G, Kelp A, Messerer P. 2000. J. Vac. Sci. Technol. A 18:2053-61
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 2053-2061
- Franz, G.¹ Kelp, A.² Messerer, P.³

30
- 0035477497
- Fuller NCM, Herman IP, Donnelly VM. 2001. J. Appl. Phys. 90:3182-91
- (2001) J. Appl. Phys. , vol.90 , pp. 3182-3191
- Fuller, N.C.M.¹ Herman, I.P.² Donnelly, V.M.³

31
- 0035082047
- Xu SL, Sun ZW, Qian XY, Holland J, Podlesnik D. 2001. J. Vac. Sci. Technol. B 19:166-71
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 166-171
- Xu, S.L.¹ Sun, Z.W.² Qian, X.Y.³ Holland, J.⁴ Podlesnik, D.⁵

32
- 0034187677
- Hioki K. Hirata H, Matsumura S, Petrovic ZL, Makabe T. 2000. J. Vac. Sci. Technol. A 18:864-72
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 864-872
- Hioki, K.¹ Hirata, H.² Matsumura, S.³ Petrovic, Z.L.⁴ Makabe, T.⁵

33
- 0037034944
- Miyoshi Y, Petrovic ZL, Makabe T. 2002. J. Phys. D 35:454-61
- (2002) J. Phys. D , vol.35 , pp. 454-461
- Miyoshi, Y.¹ Petrovic, Z.L.² Makabe, T.³

34
- 0031672330
- Tadokoro M, Hirata H, Nakano N, Petrovic ZL, Makabe T. 1998. Phys. Rev. E 57:R43-46
- (1998) Phys. Rev. E , vol.57
- Tadokoro, M.¹ Hirata, H.² Nakano, N.³ Petrovic, Z.L.⁴ Makabe, T.⁵

35
- 0033424580
- Shannon S, Holloway JP, Brake ML. 1999. J. Vac. Sci. Technol. A 17:2703-8
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2703-2708
- Shannon, S.¹ Holloway, J.P.² Brake, M.L.³

36
- 0041554115
- Shannon S, Holloway JP, Flippo K, Brake ML. 1997. Appl. Phys. Lett. 71:1467-68
- (1997) Appl. Phys. Lett. , vol.71 , pp. 1467-1468
- Shannon, S.¹ Holloway, J.P.² Flippo, K.³ Brake, M.L.⁴

37
- 0001716182
- Thomas S, Chen HH, Pang SW. 1997. J. Vac. Sci. Technol. B 15:681-86
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 681-686
- Thomas, S.¹ Chen, H.H.² Pang, S.W.³

38
- 0035108571
- Yue HH, Qin SJ, Wiseman J, Toprac A. 2001. J. Vac. Sci. Technol. A 19:66-75
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 66-75
- Yue, H.H.¹ Qin, S.J.² Wiseman, J.³ Toprac, A.⁴

39
- 0033703848
- White DA, Goodlin BE, Gower AE, Boning DS, Chen H, et al. 2000. IEEE Trans. Semicond. Manuf. 13:193-207
- (2000) IEEE Trans. Semicond. Manuf. , vol.13 , pp. 193-207
- White, D.A.¹ Goodlin, B.E.² Gower, A.E.³ Boning, D.S.⁴ Chen, H.⁵

40
- 0030596221
- Cunge G, Booth JP, Derouard J. 1996. Chem. Phys. Lett. 263:645-50
- (1996) Chem. Phys. Lett. , vol.263 , pp. 645-650
- Cunge, G.¹ Booth, J.P.² Derouard, J.³

41
- 0001620883
- Cunge G, Booth JP. 1999. J. Appl. Phys. 85:3952-59
- (1999) J. Appl. Phys. , vol.85 , pp. 3952-3959
- Cunge, G.¹ Booth, J.P.²

42
- 0000347228
- Booth JP, Cunge G, Chabert P, Sadeghi N. 1999. J. Appl. Phys. 85:3097-107
- (1999) J. Appl. Phys. , vol.85 , pp. 3097-3107
- Booth, J.P.¹ Cunge, G.² Chabert, P.³ Sadeghi, N.⁴

43
- 0001092362
- Hebner GA. 2001. J. Appl. Phys. 89:900-10
- (2001) J. Appl. Phys. , vol.89 , pp. 900-910
- Hebner, G.A.¹

44
- 0042055431
- Fleddermann CB, Hebner GA. 1998. J. Appl. Phys. 83:4030-36
- (1998) J. Appl. Phys. , vol.83 , pp. 4030-4036
- Fleddermann, C.B.¹ Hebner, G.A.²

45
- 0035875448
- Cunge G, Chabert P, Booth JP. 2001. J. Appl. Phys. 89:7750-55
- (2001) J. Appl. Phys. , vol.89 , pp. 7750-7755
- Cunge, G.¹ Chabert, P.² Booth, J.P.³

46
- 0031211723
- Cunge G, Chabert P, Booth JP. 1997. Plasma Sources Sci. Technol. 6:349-60
- (1997) Plasma Sources Sci. Technol. , vol.6 , pp. 349-360
- Cunge, G.¹ Chabert, P.² Booth, J.P.³

47
- 0035890767
- Hebner GA. 2001. J. Appl. Phys. 90: 4938-45
- (2001) J. Appl. Phys. , vol.90 , pp. 4938-4945
- Hebner, G.A.¹

48
- 0005066503
- Choi YW, Bowden MD, Muraoka K. 1996. Appl. Phys. Lett. 69:1361-63
- (1996) Appl. Phys. Lett. , vol.69 , pp. 1361-1363
- Choi, Y.W.¹ Bowden, M.D.² Muraoka, K.³

49
- 0032652092
- Czarnetzki U, Hebner GA, Luggenholscher D, Dobele HF, Riley ME. 1999. IEEE Trans. Plasma Sci. 27:70-71
- (1999) IEEE Trans. Plasma Sci. , vol.27 , pp. 70-71
- Czarnetzki, U.¹ Hebner, G.A.² Luggenholscher, D.³ Dobele, H.F.⁴ Riley, M.E.⁵

50
- 0032614967
- Malyshev MV, Fuller NCM, Bogart KHA, Donnelly VM, Herman IP. 1999. Appl. Phys. Lett. 14:1666-68
- (1999) Appl. Phys. Lett. , vol.14 , pp. 1666-1668
- Malyshev, M.V.¹ Fuller, N.C.M.² Bogart, K.H.A.³ Donnelly, V.M.⁴ Herman, I.P.⁵

51
- 0345871112
- Malyshev MV, Fuller NCM, Bogart KHA, Donnelly VM, Herman IP. 2000. J. Appl. Phys. 88:2246-51
- (2000) J. Appl. Phys. , vol.88 , pp. 2246-2251
- Malyshev, M.V.¹ Fuller, N.C.M.² Bogart, K.H.A.³ Donnelly, V.M.⁴ Herman, I.P.⁵

52
- 0037035450
- Georg A, Engemann J, Brockhaus A. 2002. J. Phys. D 35:875-81
- (2002) J. Phys. D , vol.35 , pp. 875-881
- Georg, A.¹ Engemann, J.² Brockhaus, A.³

53
- 0032072853
- Hebner GA, Fleddermann CB. 1998. J. Appl. Phys. 83:5102-7
- (1998) J. Appl. Phys. , vol.83 , pp. 5102-5107
- Hebner, G.A.¹ Fleddermann, C.B.²

54
- 0036146108
- Boogaarts MGH, Mazouffre S, Brinkman GJ, van der Heijden HWP, Vankan P, et al. 2002. Rev. Sci. Instrum. 73:73-86
- (2002) Rev. Sci. Instrum. , vol.73 , pp. 73-86
- Boogaarts, M.G.H.¹ Mazouffre, S.² Brinkman, G.J.³ Van der Heijden, H.W.P.⁴ Vankan, P.⁵

55
- 0030244288
- Hebner GA. 1996. J. Appl. Phys. 80: 2624-36
- (1996) J. Appl. Phys. , vol.80 , pp. 2624-2636
- Hebner, G.A.¹

56
- 0043057146
- Hebner GA. 1996. J. Appl. Phys. 80: 3215-20
- (1996) J. Appl. Phys. , vol.80 , pp. 3215-3220
- Hebner, G.A.¹

57
- 0031222445
- Hebner GA, Fleddermann CB, Miller PA. 1997. J. Vac. Sci. Technol. A 15:2698-708
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 2698-2708
- Hebner, G.A.¹ Fleddermann, C.B.² Miller, P.A.³

58
- 0031491504
- McMillin BK, Zachariah MR. 1997. J. Vac. Sci. Technol. A 15:230-37
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 230-237
- McMillin, B.K.¹ Zachariah, M.R.²

59
- 0033433367
- Steffens KL, Sobolewski MA. 1999. J. Vac. Sci. Technol. A 17:517-27
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 517-527
- Steffens, K.L.¹ Sobolewski, M.A.²

60
- 0036536192
- Sasaki K, Wakasaki T, Matsui S, Kadota K. 2002. J. Appl. Phys. 91:4033-39
- (2002) J. Appl. Phys. , vol.91 , pp. 4033-4039
- Sasaki, K.¹ Wakasaki, T.² Matsui, S.³ Kadota, K.⁴

61
- 0030215564
- Nakata Y, Kaibara H, Okada T, Maeda M. 1996. J. Appl. Phys. 80:2458-66
- (1996) J. Appl. Phys. , vol.80 , pp. 2458-2466
- Nakata, Y.¹ Kaibara, H.² Okada, T.³ Maeda, M.⁴

62
- 0035508028
- Ikegami T, Nakao M, Ohsima T, Ebihara K, Aoqui S. 2001. J. Vac. Sci. Technol. A 19:2737-40
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 2737-2740
- Ikegami, T.¹ Nakao, M.² Ohsima, T.³ Ebihara, K.⁴ Aoqui, S.⁵

63
- 0000494853
- McCurdy PR, Bogart KHA, Dalleska NF, Fisher ER. 1997. Rev. Sci. Instrum. 68:1684-93
- (1997) Rev. Sci. Instrum. , vol.68 , pp. 1684-1693
- McCurdy, P.R.¹ Bogart, K.H.A.² Dalleska, N.F.³ Fisher, E.R.⁴

64
- 0037076098
- Kessels WMM, McCurdy PR, Williams KL, Barker GR, Venturo VA, Fisher ER. 2002. J. Phys. Chem. B 106:2680-89
- (2002) J. Phys. Chem. B , vol.106 , pp. 2680-2689
- Kessels, W.M.M.¹ McCurdy, P.R.² Williams, K.L.³ Barker, G.R.⁴ Venturo, V.A.⁵ Fisher, E.R.⁶

65
- 0000640290
- McCurdy PR, Butoi CI, Williams KL, Fisher ER. 1999. J. Phys. Chem. B 103: 6919-29
- (1999) J. Phys. Chem. B , vol.103 , pp. 6919-6929
- McCurdy, P.R.¹ Butoi, C.I.² Williams, K.L.³ Fisher, E.R.⁴

66
- 0034317099
- Butoi CI, Mackie NM, Williams KL, Capps NE, Fisher ER. 2000. J. Vac. Sci. Technol. A 18:2685-98
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 2685-2698
- Butoi, C.I.¹ Mackie, N.M.² Williams, K.L.³ Capps, N.E.⁴ Fisher, E.R.⁵

67
- 0035273635
- Chou SI, Baer DS, Hanson RK, Collison WZ, Ni TQ. 2001. J. Vac. Sci. Technol. A 19:477-84
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 477-484
- Chou, S.I.¹ Baer, D.S.² Hanson, R.K.³ Collison, W.Z.⁴ Ni, T.Q.⁵

68
- 0000575707
- Miyata K, Hori M, Goto T. 1997. J. Vac. Sci. Technol. A 15:568-72
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 568-572
- Miyata, K.¹ Hori, M.² Goto, T.³

69
- 0031503061
- Kim SC, Billesbach DP, Dillon R. 1997. J. Vac. Sci. Technol. A 15:2247-51
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 2247-2251
- Kim, S.C.¹ Billesbach, D.P.² Dillon, R.³

70
- 0036504570
- Cruden BA, Gleason KK, Sawin HH. 2002. J. Vac. Sci. Technol. B 20:690-95
- (2002) J. Vac. Sci. Technol. B , vol.20 , pp. 690-695
- Cruden, B.A.¹ Gleason, K.K.² Sawin, H.H.³

71
- 0032137652
- Booth JP, Cunge G, Neuilly F, Sadeghi N. 1998. Plasma Sources Sci. Technol. 7:423-30
- (1998) Plasma Sources Sci. Technol , vol.7 , pp. 423-430
- Booth, J.P.¹ Cunge, G.² Neuilly, F.³ Sadeghi, N.⁴

72
- 0036166062
- Neuilly F, Booth JP, Vallier L. 2002. J. Vac. Sci. Technol. A 20:225-29
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 225-229
- Neuilly, F.¹ Booth, J.P.² Vallier, L.³

73
- 0033747618
- Johnson MC, Poochinda K, Ricker NL, Rogers JW, Pearsall TP. 2000. J. Cryst. Growth 212:11-20
- (2000) J. Cryst. Growth , vol.212 , pp. 11-20
- Johnson, M.C.¹ Poochinda, K.² Ricker, N.L.³ Rogers, J.W.⁴ Pearsall, T.P.⁵

74
- 0034512368
- Watkins SP, Pinnington T, Hu J, Yeo P, Kluth M, et al. 2000. J. Cryst. Growth 221:166-71
- (2000) J. Cryst. Growth , vol.221 , pp. 166-171
- Watkins, S.P.¹ Pinnington, T.² Hu, J.³ Yeo, P.⁴ Kluth, M.⁵

75
- 0034187918
- Dony MF, Dauchot JP, Wautelet M, Hecq M, Ricard A. 2000. J. Vac. Sci. Technol. A 18:809-13
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 809-813
- Dony, M.F.¹ Dauchot, J.P.² Wautelet, M.³ Hecq, M.⁴ Ricard, A.⁵

76
- 0032359991
- Miller PA, Hebner GA, Jarecki RL, Ni T. 1998. J. Vac. Sci. Technol. A 16:3240-46
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 3240-3246
- Miller, P.A.¹ Hebner, G.A.² Jarecki, R.L.³ Ni, T.⁴

77
- 0031153024
- Jackson AW, Pinsukanjana PR, Gossard AC, Coldren LA. 1997. IEEE J. Sci. Top. Quantum Electron. 3:836-44
- (1997) IEEE J. Sci. Top. Quantum Electron. , vol.3 , pp. 836-844
- Jackson, A.W.¹ Pinsukanjana, P.R.² Gossard, A.C.³ Coldren, L.A.⁴

78
- 0035272535
- Gibbons BJ, Hawley ME, Trolier-McKinstry S, Schlom DG. 2001. J. Vac. Sci. Technol. A 19:584-90
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 584-590
- Gibbons, B.J.¹ Hawley, M.E.² Trolier-McKinstry, S.³ Schlom, D.G.⁴

79
- 0030502159
- Yamamoto Y, Hori M, Goto T, Hiramatsu M. 1996. J. Vac. Sci. Technol. A 14:1999-2003
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 1999-2003
- Yamamoto, Y.¹ Hori, M.² Goto, T.³ Hiramatsu, M.⁴

80
- 0033423369
- Wang WZ, Hammond RH, Fejer MM, Beasley MR. 1999. J. Vac. Sci. Technol. A 17:2676-84
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2676-2684
- Wang, W.Z.¹ Hammond, R.H.² Fejer, M.M.³ Beasley, M.R.⁴

81
- 0030569879
- Wang WZ, Fejer MM, Hammond RH, Beasley MR, Ahn CH, et al. 1996. Appl. Phys. Lett. 68:729-31
- (1996) Appl. Phys. Lett. , vol.68 , pp. 729-731
- Wang, W.Z.¹ Fejer, M.M.² Hammond, R.H.³ Beasley, M.R.⁴ Ahn, C.H.⁵

82
- 0001376970
- Takashima S, Hori M, Goto T, Kono A, Ito M, Yoneda K. 1999. Appl. Phys. Lett. 75:3929-31
- (1999) Appl. Phys. Lett. , vol.75 , pp. 3929-3931
- Takashima, S.¹ Hori, M.² Goto, T.³ Kono, A.⁴ Ito, M.⁵ Yoneda, K.⁶

83
- 0036469464
- Umemoto H, Ohara K, Morita D, Nozaki Y, Masuda A, Matsumura H. 2002. J. Appl. Phys. 91:1650-56
- (2002) J. Appl. Phys. , vol.91 , pp. 1650-1656
- Umemoto, H.¹ Ohara, K.² Morita, D.³ Nozaki, Y.⁴ Masuda, A.⁵ Matsumura, H.⁶

84
- 0033484217
- Wang WZ, Hammond RH, Arnason SB, Beasley MR. 1999. J. Vac. Sci. Technol. A 17:183-89
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 183-189
- Wang, W.Z.¹ Hammond, R.H.² Arnason, S.B.³ Beasley, M.R.⁴

85
- 0000552364
- Ingle NJC, Hammond RH, Beasley MR, Blank DHA. 1999. Appl. Phys. Lett. 75:4162-64
- (1999) Appl. Phys. Lett. , vol.75 , pp. 4162-4164
- Ingle, N.J.C.¹ Hammond, R.H.² Beasley, M.R.³ Blank, D.H.A.⁴

86
- 0000275533
- Sasaki K, Kawai Y, Kadota K. 1997. Appl. Phys. Lett. 70:1375-77
- (1997) Appl. Phys. Lett. , vol.70 , pp. 1375-1377
- Sasaki, K.¹ Kawai, Y.² Kadota, K.³

87
- 0031223801
- Kawai Y, Sasaki K, Kadota K. 1997. Jpn. J. Appl. Phys. Part 2 36:L1261-64
- (1997) Jpn. J. Appl. Phys. Part 2 , vol.36
- Kawai, Y.¹ Sasaki, K.² Kadota, K.³

88
- 0000426002
- Tachibana K, Kamisugi H. 1999. Appl. Phys. Lett. 74:2390-92
- (1999) Appl. Phys. Lett. , vol.74 , pp. 2390-2392
- Tachibana, K.¹ Kamisugi, H.²

89
- 0000423901
- Kessels WMM, Hoefnagels JPM, Boogaarts MGH, Schram DC, van de Sanden MCM. 2001. J. Appl. Phys. 89:2065-73
- (2001) J. Appl. Phys. , vol.89 , pp. 2065-2073
- Kessels, W.M.M.¹ Hoefnagels, J.P.M.² Boogaarts, M.G.H.³ Schram, D.C.⁴ Van de Sanden, M.C.M.⁵

90
- 0035273526
- Kessels WMM, Leroux A, Boogaarts MGH, Hoefnagels JPM, van de Sanden MCM, Schram DC. 2001. J. Vac. Sci. Technol. A 19:467-76
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 467-476
- Kessels, W.M.M.¹ Leroux, A.² Boogaarts, M.G.H.³ Hoefnagels, J.P.M.⁴ Van de Sanden, M.C.M.⁵ Schram, D.C.⁶

91
- 0035820248
- Schwabedissen A, Brockhaus A, Georg A, Engemann J. 2001. J. Phys. D 34:1116-21
- (2001) J. Phys. D , vol.34 , pp. 1116-1121
- Schwabedissen, A.¹ Brockhaus, A.² Georg, A.³ Engemann, J.⁴

92
- 0001534442
- Engeln R, Letourneur KGY, Boogaarts MGH, van de Sanden MCM, Schram DC. 1999. Chem. Phys. Lett. 310:405-10
- (1999) Chem. Phys. Lett. , vol.310 , pp. 405-410
- Engeln, R.¹ Letourneur, K.G.Y.² Boogaarts, M.G.H.³ Van de Sanden, M.C.M.⁴ Schram, D.C.⁵

93
- 0001666727
- Booth JP, Cunge G, Biennier L, Romanini D, Kachanov A. 2000. Chem. Phys. Lett. 317:631-36
- (2000) Chem. Phys. Lett. , vol.317 , pp. 631-636
- Booth, J.P.¹ Cunge, G.² Biennier, L.³ Romanini, D.⁴ Kachanov, A.⁵

94
- 0033465471
- Bowden MD, Kogano M, Suetome Y, Hori T, Uchino K, Muraoka K. 1999. J. Vac. Sci. Technol. A 17:493-99
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 493-499
- Bowden, M.D.¹ Kogano, M.² Suetome, Y.³ Hori, T.⁴ Uchino, K.⁵ Muraoka, K.⁶

95
- 0039145556
- ElSabbagh MAM, Bowden MD, Uchino K, Muraoka K. 2001. Appl. Phys. Lett. 78:3187-89
- (2001) Appl. Phys. Lett. , vol.78 , pp. 3187-3189
- ElSabbagh, M.A.M.¹ Bowden, M.D.² Uchino, K.³ Muraoka, K.⁴

96
- 0031209523
- Cronrath W, Mayumi N, Bowden MD, Uchino K, Muraoka K, Yoshida M. 1997. J. Appl. Phys. 82:1036-41
- (1997) J. Appl. Phys. , vol.82 , pp. 1036-1041
- Cronrath, W.¹ Mayumi, N.² Bowden, M.D.³ Uchino, K.⁴ Muraoka, K.⁵ Yoshida, M.⁶

97
- 0036465976
- Rousseau A, Teboul E, Van der Sande MJ, Van der Mullen JAM. 2002. Plasma Sources Sci. Technol. 11:47-52
- (2002) Plasma Sources Sci. Technol. , vol.11 , pp. 47-52
- Rousseau, A.¹ Teboul, E.² Van der Sande, M.J.³ Van der Mullen, J.A.M.⁴

98
- 0035456827
- Morishita K, Kawaguchi N, Okada T. 2001. Jpn. J. Appl. Phys. Part 1 40:5326-28
- (2001) Jpn. J. Appl. Phys. Part I , vol.40 , pp. 5326-5328
- Morishita, K.¹ Kawaguchi, N.² Okada, T.³

99
- 0034228019
- Moriya T, Ito N, Uesugi F, Hayashi Y, Okamura K. 2000. J. Vac. Sci. Technol. A 18:1282-86
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 1282-1286
- Moriya, T.¹ Ito, N.² Uesugi, F.³ Hayashi, Y.⁴ Okamura, K.⁵

100
- 0036494321
- Takahashi K, Tachibana K. 2002. J. Vac. Sci. Technol. A 20:305-12
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 305-312
- Takahashi, K.¹ Tachibana, K.²

101
- 0035393131
- Ito N, Moriya T, Uesugi F, Moriya S, Aomori M, Kato Y. 2001. J. Vac. Sci. Technol. A 19:1248-54
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 1248-1254
- Ito, N.¹ Moriya, T.² Uesugi, F.³ Moriya, S.⁴ Aomori, M.⁵ Kato, Y.⁶

102
- 79955997985
- Creighton JR, Breiland WG, Coltrin ME, Pawlowski RP. 2002. Appl. Phys. Lett. 81:2626-28
- (2002) Appl. Phys. Lett. , vol.81 , pp. 2626-2628
- Creighton, J.R.¹ Breiland, W.G.² Coltrin, M.E.³ Pawlowski, R.P.⁴

103
- 0033459929
- Samsonov D, Goree J. 1999. J. Vac. Sci. Technol. A 17:2835-40
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2835-2840
- Samsonov, D.¹ Goree, J.²

104
- 0032046623
- Selwyn GS, Weiss CA, Sequeda F, Huang C. 1998. Thin Solid Films 317:85-92
- (1998) Thin Solid Films , vol.317 , pp. 85-92
- Selwyn, G.S.¹ Weiss, C.A.² Sequeda, F.³ Huang, C.⁴

105
- 0036564771
- Wickersham CE, Poole JE, Fan JS. 2002. J. Vac. Sci. Technol A 20:833-38
- (2002) J. Vac. Sci. Technol A , vol.20 , pp. 833-838
- Wickersham, C.E.¹ Poole, J.E.² Fan, J.S.³

106
- 0032606461
- Geohegan DB, Puretzky AA, Rader DJ. 1999. Appl. Phys. Lett. 74:3788-90
- (1999) Appl. Phys. Lett. , vol.74 , pp. 3788-3790
- Geohegan, D.B.¹ Puretzky, A.A.² Rader, D.J.³

107
- 0000435997
- Muramoto J, Inmaru T, Nakata Y, Okada T, Maeda M. 2000. Appl Phys. Lett. 77:2334-36
- (2000) Appl Phys. Lett. , vol.77 , pp. 2334-2336
- Muramoto, J.¹ Inmaru, T.² Nakata, Y.³ Okada, T.⁴ Maeda, M.⁵

108
- 0004505444
- Miyashita H, Kikuchi T, Kawasaki Y, Katakura Y, Ohsako N. 1999. J. Vac. Sci. Technol. A 17:1066-70
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 1066-1070
- Miyashita, H.¹ Kikuchi, T.² Kawasaki, Y.³ Katakura, Y.⁴ Ohsako, N.⁵

109
- 0030826023
- Aspnes DE. 1997. Solid State Commun. 101:85-92
- (1997) Solid State Commun. , vol.101 , pp. 85-92
- Aspnes, D.E.¹

110
- 0036642861
- Richter W. 2002. Appl Phys. A 75:129-40
- (2002) Appl Phys. A , vol.75 , pp. 129-140
- Richter, W.¹

111
- 17444446130
- McGilp JF. 1998. Thin Solid Films 313:533-36
- (1998) Thin Solid Films , vol.313 , pp. 533-536
- McGilp, J.F.¹

112
- 0031359695
- Zettler JT. 1997. Prog. Cryst. Growth Charact. Mater. 35:27-98
- (1997) Prog. Cryst. Growth Charact. Mater. , vol.35 , pp. 27-98
- Zettler, J.T.¹

113
- 0642301587
- Eryigit R, Herman IP. 1997. Phys. Rev. B 56:9263-66
- (1997) Phys. Rev. B , vol.56 , pp. 9263-9266
- Eryigit, R.¹ Herman, I.P.²

114
- 23044523728
- Rossow U, Mantese L, Aspnes DE. 2000. J. Vac. Sci. Technol. B 18:2229-31
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 2229-2231
- Rossow, U.¹ Mantese, L.² Aspnes, D.E.³

115
- 0035439452
- Esser N, Schmidt WG, Cobet C, Fleischer K, Shkrebtii AI, et al. 2001. J. Vac. Sci. Technol. B 19:1756-61
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 1756-1761
- Esser, N.¹ Schmidt, W.G.² Cobet, C.³ Fleischer, K.⁴ Shkrebtii, A.I.⁵

116
- 4244137953
- Schmidt WG, Esser N, Frisch AM, Vogt P, Bernholc J, et al. 2000. Phys. Rev. B 61:R16335-38
- (2000) Phys. Rev. B , vol.61
- Schmidt, W.G.¹ Esser, N.² Frisch, A.M.³ Vogt, P.⁴ Bernholc, J.⁵

117
- 0032114763
- Creighton JR, Baucom KC. 1998. Surf. Sci. 409:372-83
- (1998) Surf. Sci. , vol.409 , pp. 372-383
- Creighton, J.R.¹ Baucom, K.C.²

118
- 0000604557
- Hingerl K, Yasuda T, Hanada T, Miwa S, Kimura K, et al. 1998. J. Vac. Sci. Technol. B 16:2342-49
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 2342-2349
- Hingerl, K.¹ Yasuda, T.² Hanada, T.³ Miwa, S.⁴ Kimura, K.⁵

119
- 0035535363
- Hingerl K, Balderas-Navarro RE, Bonanni A, Stifter D. 2001. J. Vac. Sci. Technol. B 19:1650-57
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 1650-1657
- Hingerl, K.¹ Balderas-Navarro, R.E.² Bonanni, A.³ Stifter, D.⁴

120
- 23044522208
- Kampen TU, Rossow U, Schumann M, Park S, Zahn DRT. 2000. J. Vac. Sci. Technol. B 18:2077-81
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 2077-2081
- Kampen, T.U.¹ Rossow, U.² Schumann, M.³ Park, S.⁴ Zahn, D.R.T.⁵

121
- 0001539130
- Pristovsek M, Tsukamoto S, Koguchi N, Han B, Haberland K, et al. 2001. Phys. Status Solidi A 188:1423-29
- (2001) Phys. Status Solidi A , vol.188 , pp. 1423-1429
- Pristovsek, M.¹ Tsukamoto, S.² Koguchi, N.³ Han, B.⁴ Haberland, K.⁵

122
- 23044522543
- Balderas-Navarro RE, Hingerl K, Hilber W, Stifter D, Bonanni A, Sitter H. 2000. J. Vac. Sci. Technol. B 18:2224-28
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 2224-2228
- Balderas-Navarro, R.E.¹ Hingerl, K.² Hilber, W.³ Stifter, D.⁴ Bonanni, A.⁵ Sitter, H.⁶

123
- 0033689227
- Bonanni A, Hingerl K, Hilber W, Stifter D, Sitter H. 2000. J. Cryst. Growth 214:163-66
- (2000) J. Cryst. Growth , vol.214 , pp. 163-166
- Bonanni, A.¹ Hingerl, K.² Hilber, W.³ Stifter, D.⁴ Sitter, H.⁵

124
- 0034512736
- Steimetz E, Wehnert T, Kirmse H, Poser F, Zettler JT, et al. 2000. J. Cryst. Growth 221:592-98
- (2000) J. Cryst. Growth , vol.221 , pp. 592-598
- Steimetz, E.¹ Wehnert, T.² Kirmse, H.³ Poser, F.⁴ Zettler, J.T.⁵

125
- 0037070675
- Gonzalez MU, Garcia JM, Gonzalez L, Silveira JP, Gonzalez Y, et al. 2002. Appl. Surf. Sci. 188:188-92
- (2002) Appl. Surf. Sci. , vol.188 , pp. 188-192
- Gonzalez, M.U.¹ Garcia, J.M.² Gonzalez, L.³ Silveira, J.P.⁴ Gonzalez, Y.⁵

126
- 5744230279
- Yasuda T, Yamasaki S, Nishizawa M, Miyata N, Shklyaev A, et al. 2001. Phys. Rev. Lett. 87:37403
- (2001) Phys. Rev. Lett. , vol.87 , pp. 37403
- Yasuda, T.¹ Yamasaki, S.² Nishizawa, M.³ Miyata, N.⁴ Shklyaev, A.⁵

127
- 0000184257
- MacDonald BF, Cole RJ. 2001. Phys. Status Solidi A 188:1489-93
- (2001) Phys. Status Solidi A , vol.188 , pp. 1489-1493
- MacDonald, B.F.¹ Cole, R.J.²

128
- 0000838263
- LastrasMartinez LF, LastrasMartinez A. 1996. Phys. Rev. B 54:10726-35
- (1996) Phys. Rev. B , vol.54 , pp. 10726-10735
- LastrasMartinez, L.F.¹ LastrasMartinez, A.²

129
- 0010686444
- Chen YH, Wang ZG, Qian JJ, Yang Z. 2000. J. Appl. Phys. 88:1695-97
- (2000) J. Appl. Phys. , vol.88 , pp. 1695-1697
- Chen, Y.H.¹ Wang, Z.G.² Qian, J.J.³ Yang, Z.⁴

130
- 0035806195
- Balderas-Navarro RE, Hingerl K, Bonanni A, Sitter H, Stifter D. 2001. Appl. Phys. Lett. 78:3615-17
- (2001) Appl. Phys. Lett. , vol.78 , pp. 3615-3617
- Balderas-Navarro, R.E.¹ Hingerl, K.² Bonanni, A.³ Sitter, H.⁴ Stifter, D.⁵

131
- 0000299153
- Lastras-Martinez A, Balderas-Navarro RE, Cantu-Alejandro P, Lastras-Martinez LF. 1999. J. Appl. Phys. 86:2062-65
- (1999) J. Appl. Phys. , vol.86 , pp. 2062-2065
- Lastras-Martinez, A.¹ Balderas-Navarro, R.E.² Cantu-Alejandro, P.³ Lastras-Martinez, L.F.⁴

132
- 0010726392
- Holden T, Pollak FH, Freeouf JL, McInturff D, Gray JL, et al. 1997. Appl. Phys. Lett. 70:1107-9
- (1997) Appl. Phys. Lett. , vol.70 , pp. 1107-1109
- Holden, T.¹ Pollak, F.H.² Freeouf, J.L.³ McInturff, D.⁴ Gray, J.L.⁵

133
- 0031539940
- Eryigit R, Marschel PK, Herman IP. 1997. J. Vac. Sci. Technol. A 15:138-44
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 138-144
- Eryigit, R.¹ Marschel, P.K.² Herman, I.P.³

134
- 0007139723
- Dietz N, Woods V, Ito K, Lauko I. 1999. J. Vac. Sci. Technol. A 17:1300-6
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 1300-1306
- Dietz, N.¹ Woods, V.² Ito, K.³ Lauko, I.⁴

135
- 0033435042
- Lee TW, Hwang H, Moon Y, Yoon E, Kim YD. 1999. J. Vac. Sci. Technol. A 17: 2663-67
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2663-2667
- Lee, T.W.¹ Hwang, H.² Moon, Y.³ Yoon, E.⁴ Kim, Y.D.⁵

136
- 0034206162
- Kobayashi N, Kobayashi Y. 2000. Appl. Surf. Sci. 159:398-404
- (2000) Appl. Surf. Sci. , vol.159 , pp. 398-404
- Kobayashi, N.¹ Kobayashi, Y.²

137
- 0006896853
- Nakamura F, Kim YD, Yoon E, Forbes DV, Coleman JJ. 1998. J. Appl. Phys. 83:775-78
- (1998) J. Appl. Phys. , vol.83 , pp. 775-778
- Nakamura, F.¹ Kim, Y.D.² Yoon, E.³ Forbes, D.V.⁴ Coleman, J.J.⁵

138
- 0032024684
- Fang HB, Eng J, Su CC, Vemuri S, Herman IP, Bent BE. 1998. Langmuir 14:1375-78
- (1998) Langmuir , vol.14 , pp. 1375-1378
- Fang, H.B.¹ Eng, J.² Su, C.C.³ Vemuri, S.⁴ Herman, I.P.⁵ Bent, B.E.⁶

139
- 0032477162
- Kobayashi N. 1998. J. Cryst. Growth 195:228-33
- (1998) J. Cryst. Growth , vol.195 , pp. 228-233
- Kobayashi, N.¹

140
- 0001308463
- Zhu XD, Lu HB, Yang GZ, Li ZY, Gu BY, Zhang DZ. 1998. Phys. Rev. B 57:2514-19
- (1998) Phys. Rev. B , vol.57 , pp. 2514-2519
- Zhu, X.D.¹ Lu, H.B.² Yang, G.Z.³ Li, Z.Y.⁴ Gu, B.Y.⁵ Zhang, D.Z.⁶

141
- 0031270036
- Choe JY, Herman IP, Donnelly VM. 1997. J. Vac. Sci. Technol. A 15:3024-31
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 3024-3031
- Choe, J.Y.¹ Herman, I.P.² Donnelly, V.M.³

142
- 0034318827
- Choe JY, Fuller NCM, Donnelly VM, Herman IP. 2000. J. Vac. Sci. Technol. A 18:2669-79
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 2669-2679
- Choe, J.Y.¹ Fuller, N.C.M.² Donnelly, V.M.³ Herman, I.P.⁴

143
- 0042556255
- Choe JY, Herman IP, Donnelly VM. 1998. J. Vac. Sci. Technol. A 16:3266-73
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 3266-3273
- Choe, J.Y.¹ Herman, I.P.² Donnelly, V.M.³

144
- 0037051806
- Chabal YJ, Raghavachari K. 2002. Surf. Sci. 502:41-50
- (2002) Surf. Sci. , vol.502 , pp. 41-50
- Chabal, Y.J.¹ Raghavachari, K.²

145
- 0035838017
- Queeney KT, Fukidome H, Chaban EE, Chabal YJ. 2001. J. Phys. Chem. B 105: 3903-7
- (2001) J. Phys. Chem. B , vol.105 , pp. 3903-3907
- Queeney, K.T.¹ Fukidome, H.² Chaban, E.E.³ Chabal, Y.J.⁴

146
- 0035272269
- Bermudez VM, DeSisto WJ. 2001. J. Vac. Sci. Technol. A 19:576-83
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 576-583
- Bermudez, V.M.¹ DeSisto, W.J.²

147
- 0001588911
- Nishizawa M, Yasuda T, Yamasaki S, Shinohara M, Kamakura N, et al. 2001. J. Vac. Sci. Technol. A 19:2001-6
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 2001-2006
- Nishizawa, M.¹ Yasuda, T.² Yamasaki, S.³ Shinohara, M.⁴ Kamakura, N.⁵

148
- 0036564750
- Kessels WMM, Marra DC, van de Sanden MCM, Aydil ES. 2002. J. Vac. Sci. Technol. A 20:781-89
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 781-789
- Kessels, W.M.M.¹ Marra, D.C.² Van de Sanden, M.C.M.³ Aydil, E.S.⁴

149
- 0030494357
- Han SM, Aydil ES. 1996. J. Vac. Sci. Technol. A 14:2062-70
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 2062-2070
- Han, S.M.¹ Aydil, E.S.²

150
- 0032369236
- Hanyaloglu BF, Aydil ES. 1998. J. Vac. Sci. Technol. A 16:2794-803
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 2794-2803
- Hanyaloglu, B.F.¹ Aydil, E.S.²

151
- 0033884586
- Scheible P, Lunk A. 2000. Thin Solid Films 364:40-44
- (2000) Thin Solid Films , vol.364 , pp. 40-44
- Scheible, P.¹ Lunk, A.²

152
- 0030235373
- Hattori T, Aiba T, Iijima E, Okube Y, Nohira H, et al. 1996. Appl. Surf. Sci. 104/105:323-28
- (1996) Appl. Surf. Sci. , vol.104-105 , pp. 323-328
- Hattori, T.¹ Aiba, T.² Iijima, E.³ Okube, Y.⁴ Nohira, H.⁵

153
- 0035842813
- Zhang X, Garfunkel E, Chabal YJ, Christman SB, Chaban EE. 2001. Appl. Phys. Lett. 79:4051-53
- (2001) Appl. Phys. Lett. , vol.79 , pp. 4051-4053
- Zhang, X.¹ Garfunkel, E.² Chabal, Y.J.³ Christman, S.B.⁴ Chaban, E.E.⁵

154
- 0000060263
- Stefanov BB, Gurevich AB, Weldon MK, Raghavachari K, Chabal YJ. 1998. Phys. Rev. Lett. 81:3908-11
- (1998) Phys. Rev. Lett. , vol.81 , pp. 3908-3911
- Stefanov, B.B.¹ Gurevich, A.B.² Weldon, M.K.³ Raghavachari, K.⁴ Chabal, Y.J.⁵

155
- 24644516281
- Weldon MK, Queeney KT, Chabal YJ, Stefanov BB, Raghavachari K. 1999. J. Vac. Sci. Technol. B 17:1795-802
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 1795-1802
- Weldon, M.K.¹ Queeney, K.T.² Chabal, Y.J.³ Stefanov, B.B.⁴ Raghavachari, K.⁵

156
- 0012354789
- Gurevich AB, Weldon MK, Chabal YJ, Opila RL, Sapjeta J. 1999. Appl. Phys. Lett. 74:1257-59
- (1999) Appl. Phys. Lett. , vol.74 , pp. 1257-1259
- Gurevich, A.B.¹ Weldon, M.K.² Chabal, Y.J.³ Opila, R.L.⁴ Sapjeta, J.⁵

157
- 0035251534
- Queeney KT, Chabal YJ, Raghavachari K. 2001. Phys. Rev. Lett. 86:1046-49
- (2001) Phys. Rev. Lett. , vol.86 , pp. 1046-1049
- Queeney, K.T.¹ Chabal, Y.J.² Raghavachari, K.³

158
- 0035820753
- Amy F, Enriquez H, Soukiassian P, Storino PF, Chabal YJ, et al. 2001. Phys. Rev. Lett. 86:4342-45
- (2001) Phys. Rev. Lett. , vol.86 , pp. 4342-4345
- Amy, F.¹ Enriquez, H.² Soukiassian, P.³ Storino, P.F.⁴ Chabal, Y.J.⁵

159
- 4944228126
- Pluchery O, Eng J, Opila RL, Chabal YJ. 2002. Surf. Sci. 502:75-80
- (2002) Surf. Sci. , vol.502 , pp. 75-80
- Pluchery, O.¹ Eng, J.² Opila, R.L.³ Chabal, Y.J.⁴

160
- 0035418786
- Godfrey AR, Ullal SJ, Braly LB, Edelberg EA, Vahedi V, Aydil ES. 2001. Rev. Sci. Instrum. 72:3260-69
- (2001) Rev. Sci. Instrum. , vol.72 , pp. 3260-3269
- Godfrey, A.R.¹ Ullal, S.J.² Braly, L.B.³ Edelberg, E.A.⁴ Vahedi, V.⁵ Aydil, E.S.⁶

161
- 0036162520
- Ullal SJ, Godfrey AR, Edelberg E, Braly L, Vahedi V, Aydil ES. 2002. J. Vac. Sci. Technol. A 20:43-52
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 43-52
- Ullal, S.J.¹ Godfrey, A.R.² Edelberg, E.³ Braly, L.⁴ Vahedi, V.⁵ Aydil, E.S.⁶

162
- 0036494223
- Ullal SJ, Singh H, Vahedi V, Aydil ES. 2002. J. Vac. Sci. Technol. A 20:499-506
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 499-506
- Ullal, S.J.¹ Singh, H.² Vahedi, V.³ Aydil, E.S.⁴

163
- 0036649080
- Ullal SJ, Singh H, Daugherty J, Vahedi V, Aydil ES. 2002. J. Vac. Sci. Technol. A 20:1195-201
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 1195-1201
- Ullal, S.J.¹ Singh, H.² Daugherty, J.³ Vahedi, V.⁴ Aydil, E.S.⁵

164
- 0035108729
- Kawada H, Yamane M, Kitsunai H, Suzuki S. 2001. J. Vac. Sci. Technol. A 19:31-37
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 31-37
- Kawada, H.¹ Yamane, M.² Kitsunai, H.³ Suzuki, S.⁴

165
- 0342292364
- Weldon MK, Chabal YJ, Hamann DR, Christman SB, Chaban EE, Feldman LC. 1996. J. Vac. Sci. Technol. B 14:3095-106
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 3095-3106
- Weldon, M.K.¹ Chabal, Y.J.² Hamann, D.R.³ Christman, S.B.⁴ Chaban, E.E.⁵ Feldman, L.C.⁶

166
- 22644450003
- Milekhin A, Friedrich M, Hiller K, Wiemer M, Gessner T, Zahn DRT. 1999. J. Vac. Sci. Technol. B 17:1733-37
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 1733-1737
- Milekhin, A.¹ Friedrich, M.² Hiller, K.³ Wiemer, M.⁴ Gessner, T.⁵ Zahn, D.R.T.⁶

167
- 0035894154
- Hansen DM, Albaugh CE, Moran PD, Kuech TF. 2001. J. Appl. Phys. 90:5991-99
- (2001) J. Appl. Phys. , vol.90 , pp. 5991-5999
- Hansen, D.M.¹ Albaugh, C.E.² Moran, P.D.³ Kuech, T.F.⁴

168
- 0342727389
- Weldon MK, Marsico VE, Chabal YJ, Agarwal A, Eaglesham DJ, et al. 1997. J. Vac. Sci. Technol. B 15:1065-73
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 1065-1073
- Weldon, M.K.¹ Marsico, V.E.² Chabal, Y.J.³ Agarwal, A.⁴ Eaglesham, D.J.⁵

169
- 0000165679
- Pinnington T, Lavoie C, Tiedje T, Haveman B, Nodwell E. 1997. Phys. Rev. Lett. 79:1698-701
- (1997) Phys. Rev. Lett. , vol.79 , pp. 1698-1701
- Pinnington, T.¹ Lavoie, C.² Tiedje, T.³ Haveman, B.⁴ Nodwell, E.⁵

170
- 23044521415
- Gonzalez MU, Sanchez-Gil JA, Gonzalez Y, Gonzalez L, Mendez ER. 2000. J. Vac. Sci. Technol. B 18:1980-90
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 1980-1990
- Gonzalez, M.U.¹ Sanchez-Gil, J.A.² Gonzalez, Y.³ Gonzalez, L.⁴ Mendez, E.R.⁵

171
- 0037070674
- Gonzalez MU, Gonzalez Y, Gonzalez L. 2002. Appl. Surf. Sci. 188:128-33
- (2002) Appl. Surf. Sci. , vol.188 , pp. 128-133
- Gonzalez, M.U.¹ Gonzalez, Y.² Gonzalez, L.³

172
- 0005094793
- Chason E, Sinclair MB, Floro JA, Hunter JA, Hwang RQ. 1998. Appl. Phys. Lett. 72:3276-78
- (1998) Appl. Phys. Lett. , vol.72 , pp. 3276-3278
- Chason, E.¹ Sinclair, M.B.² Floro, J.A.³ Hunter, J.A.⁴ Hwang, R.Q.⁵

173
- 0001509803
- Drews D, Schneider A, Zahn DRT. 1997. J. Vac. Sci. Technol. B 15:1128-32
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 1128-1132
- Drews, D.¹ Schneider, A.² Zahn, D.R.T.³

174
- 0031706362
- Zahn DRT. 1998. Appl. Surf. Sci. 123: 276-82
- (1998) Appl. Surf. Sci. , vol.123 , pp. 276-282
- Zahn, D.R.T.¹

175
- 0033242198
- Kampen TU, Tenne DA, Park S, Salvan G, Scholz R, Zahn DRT. 1999. Phys. Status Solidi B 215:431-34
- (1999) Phys. Status Solidi B , vol.215 , pp. 431-434
- Kampen, T.U.¹ Tenne, D.A.² Park, S.³ Salvan, G.⁴ Scholz, R.⁵ Zahn, D.R.T.⁶

176
- 0035898872
- Salvan G, Tenne DA, Kampen TU, Scholz R, Jungnickel G, et al. 2001. Appl. Surf. Sci. 179:113-17
- (2001) Appl. Surf. Sci. , vol.179 , pp. 113-117
- Salvan, G.¹ Tenne, D.A.² Kampen, T.U.³ Scholz, R.⁴ Jungnickel, G.⁵

177
- 0001935434
- Lupke G. 1999. Surf. Sci. Rep. 35:77-161
- (1999) Surf. Sci. Rep. , vol.35 , pp. 77-161
- Lupke, G.¹

178
- 0032367489
- Haraichi S, Sasaki F. 1998. J. Vac. Sci. Technol. A 16:3029-33
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 3029-3033
- Haraichi, S.¹ Sasaki, F.²

179
- 0001181639
- Hu XF, Xu Z, Lim D, Downer MC, Parkinson PS, et al. 1997. Appl. Phys. Lett. 71:1376-78
- (1997) Appl. Phys. Lett. , vol.71 , pp. 1376-1378
- Hu, X.F.¹ Xu, Z.² Lim, D.³ Downer, M.C.⁴ Parkinson, P.S.⁵

180
- 0033905521
- Mantese L, Selinidis K, Wilson PT, Lim D, Jiang YY, et al. 2000. Appl. Surf. Sci. 154:229-37
- (2000) Appl. Surf. Sci. , vol.154 , pp. 229-237
- Mantese, L.¹ Selinidis, K.² Wilson, P.T.³ Lim, D.⁴ Jiang, Y.Y.⁵

181
- 0031521789
- Nakamura K, Kurokawa A, Ichimura S. 1997. J. Vac. Sci. Technol. A 15:2441-45
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 2441-2445
- Nakamura, K.¹ Kurokawa, A.² Ichimura, S.³

182
- 0041554112
- Florsheimer M, Bosch M, Brillert C, Wierschem M, Fuchs H. 1997. J. Vac. Sci. Technol. B 15:1564-68
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 1564-1568
- Florsheimer, M.¹ Bosch, M.² Brillert, C.³ Wierschem, M.⁴ Fuchs, H.⁵

183
- 0035743559
- Shen YR. 2001. Pure Appl. Chem. 73: 1589-98
- (2001) Pure Appl. Chem. , vol.73 , pp. 1589-1598
- Shen, Y.R.¹

184
- 0035507359
- Buck M, Himmelhaus M. 2001. J. Vac. Sci. Technol. A 19:2717-36
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 2717-2736
- Buck, M.¹ Himmelhaus, M.²

185
- 0035575964
- Chen P, Kung KY, Shen YR, Somorjai GA. 2001. Surf. Sci. 494:289-97
- (2001) Surf. Sci. , vol.494 , pp. 289-297
- Chen, P.¹ Kung, K.Y.² Shen, Y.R.³ Somorjai, G.A.⁴

186
- 0036420639
- Chen Z, Shen YR, Somorjai GA. 2002. Annu. Rev. Phys. Chem. 53:437-65
- (2002) Annu. Rev. Phys. Chem. , vol.53 , pp. 437-465
- Chen, Z.¹ Shen, Y.R.² Somorjai, G.A.³

187
- 0034809799
- Heerwagen A, Strobel M, Himmelhaus M, Buck M. 2001. J. Am. Chem. Soc. 123:6732-33
- (2001) J. Am. Chem. Soc. , vol.123 , pp. 6732-6733
- Heerwagen, A.¹ Strobel, M.² Himmelhaus, M.³ Buck, M.⁴

188
- 0030568358
- Zinck JJ, Chow DH, Schulman JN, Dunlap HL. 1996. Appl Phys. Lett. 68:1406-8
- (1996) Appl Phys. Lett. , vol.68 , pp. 1406-1408
- Zinck, J.J.¹ Chow, D.H.² Schulman, J.N.³ Dunlap, H.L.⁴

189
- 0035828618
- Zinck JJ, Ross RS, Owen JHG, Barvosa-Carter W, Grosse F, Ratsch C. 2001. Appl. Phys. Lett. 79:2354-56
- (2001) Appl. Phys. Lett. , vol.79 , pp. 2354-2356
- Zinck, J.J.¹ Ross, R.S.² Owen, J.H.G.³ Barvosa-Carter, W.⁴ Grosse, F.⁵ Ratsch, C.⁶

190
- 0029536259
- Breiland WG, Killeen KP. 1995. J. Appl. Phys. 78:6726-36
- (1995) J. Appl. Phys. , vol.78 , pp. 6726-6736
- Breiland, W.G.¹ Killeen, K.P.²

191
- 0031547209
- Breiland WG, Hou HQ, Chui HC, Hammons BE. 1997. J. Cryst. Growth 174:564-71
- (1997) J. Cryst. Growth , vol.174 , pp. 564-571
- Breiland, W.G.¹ Hou, H.Q.² Chui, H.C.³ Hammons, B.E.⁴

192
- 0032651586
- Breiland WG, Coltrin ME, Creighton JR, Hou HQ, Moffat HK, Tsao JY. 1999. Mater. Sci. Eng. R 24:241-74
- (1999) Mater. Sci. Eng. R , vol.24 , pp. 241-274
- Breiland, W.G.¹ Coltrin, M.E.² Creighton, J.R.³ Hou, H.Q.⁴ Moffat, H.K.⁵ Tsao, J.Y.⁶

193
- 0042055424
- Tabet MF, Kelkar U, McGahan WA. 2000. J. Vac. Sci. Technol. A 18:1704-8
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 1704-1708
- Tabet, M.F.¹ Kelkar, U.² McGahan, W.A.³

194
- 0033101347
- Rebey A, El Jani B, Leycuras A, Laugt S, Gibart P. 1999. Appl. Phys. A 68:349-52
- (1999) Appl. Phys. A , vol.68 , pp. 349-352
- Rebey, A.¹ El Jani, B.² Leycuras, A.³ Laugt, S.⁴ Gibart, P.⁵

195
- 0012628733
- Benson TE, Kamlet LI, Ruegsegger SM, Hanish CK, Hanish PD, et al. 1996. J. Vac. Sci. Technol. B 14:483-88
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 483-488
- Benson, T.E.¹ Kamlet, L.I.² Ruegsegger, S.M.³ Hanish, C.K.⁴ Hanish, P.D.⁵

196
- 0033313414
- Steinsland E, Finstad T, Hanneborg A. 1999. J. Electrochem. Soc. 146:3890-95
- (1999) J. Electrochem. Soc. , vol.146 , pp. 3890-3895
- Steinsland, E.¹ Finstad, T.² Hanneborg, A.³

197
- 0032048561
- Sarfaty M, Baum C, Harper M, Hershkowitz N, Shohet JL. 1998. Jpn. J. Appl. Phys. Part 1 37:2381-87
- (1998) Jpn. J. Appl. Phys. Part 1 , vol.37 , pp. 2381-2387
- Sarfaty, M.¹ Baum, C.² Harper, M.³ Hershkowitz, N.⁴ Shohet, J.L.⁵

198
- 0031482565
- Khamsehpour B, Wilkinson CDW, Chapman JN. 1997. J. Vac. Sci. Technol. A 15:2069-73
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 2069-2073
- Khamsehpour, B.¹ Wilkinson, C.D.W.² Chapman, J.N.³

199
- 0031143606
- Wong K, Boning DS, Sawin HH, Butler SW, Sachs EM. 1997. J. Vac. Sci. Technol. A 15:1403-8
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 1403-1408
- Wong, K.¹ Boning, D.S.² Sawin, H.H.³ Butler, S.W.⁴ Sachs, E.M.⁵

200
- 0343824348
- Pendharkar SV, Resnick DJ, Dauksher WJ, Cummings KD, Tepermeister I, Conner WT. 1997. J. Vac. Sci. Technol. A 15:816-19
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 816-819
- Pendharkar, S.V.¹ Resnick, D.J.² Dauksher, W.J.³ Cummings, K.D.⁴ Tepermeister, I.⁵ Conner, W.T.⁶

201
- 0031077370
- Vincent TL, Khargonekar PP, Terry FL. 1997, IEEE Trans. Semicond. Manuf. 10:42-51
- (1997) IEEE Trans. Semicond. Manuf. , vol.10 , pp. 42-51
- Vincent, T.L.¹ Khargonekar, P.P.² Terry, F.L.³

202
- 0030261288
- Ishikawa Y, Nakakoshi K, Fukui T. 1996, J. Cryst. Growth 167:434-39
- (1996) J. Cryst. Growth , vol.167 , pp. 434-439
- Ishikawa, Y.¹ Nakakoshi, K.² Fukui, T.³

203
- 0033261753
- Layadi N, Molloy SJ, Esry TC, Lill T, Trevor J, et al. 1999. J. Vac. Sci. Technol. B 17:2630-37
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 2630-2637
- Layadi, N.¹ Molloy, S.J.² Esry, T.C.³ Lill, T.⁴ Trevor, J.⁵

204
- 0036565090
- Moussa H, Daneau R, Meriadec C, Manin L, Sagnes I, Raj R. 2002. J. Vac. Sci. Technol. A 20:748-53
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 748-753
- Moussa, H.¹ Daneau, R.² Meriadec, C.³ Manin, L.⁴ Sagnes, I.⁵ Raj, R.⁶

205
- 0035519453
- Lill T, Grimbergen M, Mui D. 2001. J. Vac. Sci. Technol. B 19:2123-28
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 2123-2128
- Lill, T.¹ Grimbergen, M.² Mui, D.³

206
- 0031142813
- Sieg RM, Sacks RN, Ringel SA. 1997. J. Cryst. Growth 175:256-61
- (1997) J. Cryst. Growth , vol.175 , pp. 256-261
- Sieg, R.M.¹ Sacks, R.N.² Ringel, S.A.³

207
- 0035108569
- Ng HM, Chu SNG, Cho AY. 2001. J. Vac. Sci. Technol. A 19:292-94
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 292-294
- Ng, H.M.¹ Chu, S.N.G.² Cho, A.Y.³

208
- 0034314734
- Stutzman BS, Huang HT, Terry FL. 2000. J. Vac. Sci. Technol. B 18:2785-93
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 2785-2793
- Stutzman, B.S.¹ Huang, H.T.² Terry, F.L.³

209
- 24644472878
- Bibby T, Adams JA, Holland K. 1999. J. Vac. Sci. Technol. B 17:2378-84
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 2378-2384
- Bibby, T.¹ Adams, J.A.² Holland, K.³

210
- 0035083657
- Dragnea B, Preusser J, Szarko JM, Leone SR, Hinsberg WD. 2001. J. Vac. Sci. Technol. B 19:142-52
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 142-152
- Dragnea, B.¹ Preusser, J.² Szarko, J.M.³ Leone, S.R.⁴ Hinsberg, W.D.⁵

211
- 0032001178
- Collins RW, An I, Fujiwara H, Lee JC, Lu YW, et al. 1998. Thin Solid Films 313:18-32
- (1998) Thin Solid Films , vol.313 , pp. 18-32
- Collins, R.W.¹ An, I.² Fujiwara, H.³ Lee, J.C.⁴ Lu, Y.W.⁵

212
- 0000307569
- Aspnes DE. 1996. J. Vac. Sci. Technol. A 14:960-66
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 960-966
- Aspnes, D.E.¹

213
- 0003684325
- New York: Wiley
- Tompkins HG, McGahan WA. 1999. Spectroscopic Ellipsometry and Reflectometry: A User's Guide. New York: Wiley
- (1999) Spectroscopic Ellipsometry and Reflectometry: A User's Guide
- Tompkins, H.G.¹ McGahan, W.A.²

214
- 0038815642
- Lee J, Collins RW. 1998. Appl. Opt. 37:4230-38
- (1998) Appl. Opt. , vol.37 , pp. 4230-4238
- Lee, J.¹ Collins, R.W.²

215
- 0001473442
- Zapien JA, Collins RW, Messier R. 2000. Rev. Sci. Instrum. 71:3451-60
- (2000) Rev. Sci. Instrum. , vol.71 , pp. 3451-3460
- Zapien, J.A.¹ Collins, R.W.² Messier, R.³

216
- 0035275536
- Lee J, Koh J, Collins RW. 2001. Rev. Sci. Instrum. 72:1742-54
- (2001) Rev. Sci. Instrum. , vol.72 , pp. 1742-1754
- Lee, J.¹ Koh, J.² Collins, R.W.³

217
- 0000876009
- Boher P, Stehle JL. 1996. Mater. Sci. Eng. B 37:116-20
- (1996) Mater. Sci. Eng. B , vol.37 , pp. 116-120
- Boher, P.¹ Stehle, J.L.²

218
- 0035276659
- Ebert M, Bell KA, Flock K, Aspnes DE. 2001. Phys. Status Solidi A 184:79-87
- (2001) Phys. Status Solidi A , vol.184 , pp. 79-87
- Ebert, M.¹ Bell, K.A.² Flock, K.³ Aspnes, D.E.⁴

219
- 0031999919
- Drevillon B. 1998. Thin Solid Films 313:625-30
- (1998) Thin Solid Films , vol.313 , pp. 625-630
- Drevillon, B.¹

220
- 0001662102
- Heitz T, Drevillon B, Godet C, Bouree JE. 1998. Phys. Rev. B 58:13957-73
- (1998) Phys. Rev. B , vol.58 , pp. 13957-13973
- Heitz, T.¹ Drevillon, B.² Godet, C.³ Bouree, J.E.⁴

221
- 0032353245
- Kroesen GMW, Lee HJ, Moriguchi H, Motomura H, Shirafuji T, Tachibana K. 1998. J. Vac. Sci. Technol. A 16:225-32
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 225-232
- Kroesen, G.M.W.¹ Lee, H.J.² Moriguchi, H.³ Motomura, H.⁴ Shirafuji, T.⁵ Tachibana, K.⁶

222
- 0034228663
- Bell KA, Ebert M, Yoo SD, Flock K, Aspnes DE. 2000. J. Vac. Sci. Technol. A 18:1184-89
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 1184-1189
- Bell, K.A.¹ Ebert, M.² Yoo, S.D.³ Flock, K.⁴ Aspnes, D.E.⁵

223
- 0035794374
- Zapien JA, Messier R, Collins RW. 2001. Appl. Phys. Lett. 78:1982-84
- (2001) Appl. Phys. Lett. , vol.78 , pp. 1982-1984
- Zapien, J.A.¹ Messier, R.² Collins, R.W.³

224
- 0012066920
- Fukarek W. 2001. J. Vac. Sci. Technol. A 19:2017-24
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 2017-2024
- Fukarek, W.¹

225
- 0036649064
- Zapien JA, Collins RW, Messier R. 2002. J. Vac. Sci. Technol. A 20:1395-407
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 1395-1407
- Zapien, J.A.¹ Collins, R.W.² Messier, R.³

226
- 0031121028
- Fujiwara H, Koh J, Wronski CR, Collins RW. 1997. Appl. Phys. Lett. 70:2150-52
- (1997) Appl. Phys. Lett. , vol.70 , pp. 2150-2152
- Fujiwara, H.¹ Koh, J.² Wronski, C.R.³ Collins, R.W.⁴

227
- 0000705536
- Koh J, Fujiwara H, Koval RJ, Wronski CR, Collins RW. 1999. J. Appl. Phys. 85:4141-53
- (1999) J. Appl. Phys. , vol.85 , pp. 4141-4153
- Koh, J.¹ Fujiwara, H.² Koval, R.J.³ Wronski, C.R.⁴ Collins, R.W.⁵

228
- 0036162531
- Akazawa H. 2002. J. Vac. Sci. Technol. A 20:53-59
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 53-59
- Akazawa, H.¹

229
- 0001450067
- Peters S, Schmidtling T, Trepk T, Pohl UW, Zettler JT, Richter W. 2000. J. Appl. Phys. 88:4085-90
- (2000) J. Appl. Phys. , vol.88 , pp. 4085-4090
- Peters, S.¹ Schmidtling, T.² Trepk, T.³ Pohl, U.W.⁴ Zettler, J.T.⁵ Richter, W.⁶

230
- 0034186943
- Roth JA, Williamson WS, Chow DH, Olson GL, Johs B. 2000. J. Vac. Sci. Technol. B 18:1439-42
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 1439-1442
- Roth, J.A.¹ Williamson, W.S.² Chow, D.H.³ Olson, G.L.⁴ Johs, B.⁵

231
- 22644451096
- Lee JS, Sugou S, Ren HW, Masumoto Y. 1999. J. Vac. Sci. Technol. B 17:1341-45
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 1341-1345
- Lee, J.S.¹ Sugou, S.² Ren, H.W.³ Masumoto, Y.⁴

232
- 0034187788
- Aqariden F, Shih HD, Liao PK, Duncan WM, Dat R. 2000. J. Vac. Sci. Technol. B 18:1381-84
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 1381-1384
- Aqariden, F.¹ Shih, H.D.² Liao, P.K.³ Duncan, W.M.⁴ Dat, R.⁵

233
- 0032683550
- Roth JA, Chow DH, Olson GL, Brewer PD, Williamson WS, Johs B. 1999. J. Cryst. Growth 202:31-35
- (1999) J. Cryst. Growth , vol.202 , pp. 31-35
- Roth, J.A.¹ Chow, D.H.² Olson, G.L.³ Brewer, P.D.⁴ Williamson, W.S.⁵ Johs, B.⁶

234
- 22644448608
- Johnson SR, Grassi E, Beaudoin M, Boonzaayer MD, Tsakalis KS, Zhang YH. 1999. J. Vac. Sci. Technol. B 17:1237-40
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 1237-1240
- Johnson, S.R.¹ Grassi, E.² Beaudoin, M.³ Boonzaayer, M.D.⁴ Tsakalis, K.S.⁵ Zhang, Y.H.⁶

235
- 22644450140
- Grassi E, Johnson SR, Beaudoin M, Tsakalis KS. 1999. J. Vac. Sci. Technol. B 17:1223-26
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 1223-1226
- Grassi, E.¹ Johnson, S.R.² Beaudoin, M.³ Tsakalis, K.S.⁴

236
- 0009966298
- Kildemo M. 1998. Appl. Opt. 37:113-24
- (1998) Appl. Opt. , vol.37 , pp. 113-124
- Kildemo, M.¹

237
- 0033424581
- Liu C, Erdmann J, Maj J, Macrander A. 1999. J. Vac. Sci. Technol. A 17:2741-48
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2741-2748
- Liu, C.¹ Erdmann, J.² Maj, J.³ Macrander, A.⁴

238
- 0034225960
- Heitz T, Hofrichter A, Bulkin P, Drevillon B. 2000. J. Vac. Sci. Technol. A 18:1303-7
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 1303-1307
- Heitz, T.¹ Hofrichter, A.² Bulkin, P.³ Drevillon, B.⁴

239
- 0034229430
- Vergohl M, Hunsche B, Malkomes N, Matthee T, Szyszka B. 2000. J. Vac. Sci. Technol. A 18:1709-12
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 1709-1712
- Vergohl, M.¹ Hunsche, B.² Malkomes, N.³ Matthee, T.⁴ Szyszka, B.⁵

240
- 78649785930
- Gao Y, Mueller AH, Irene EA, Auciello O, Krauss A, Schulte JA. 1999. J. Vac. Sci. Technol. A 17:1880-86
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 1880-1886
- Gao, Y.¹ Mueller, A.H.² Irene, E.A.³ Auciello, O.⁴ Krauss, A.⁵ Schulte, J.A.⁶

241
- 79955998846
- Mueller AH, Suvorova NA, Irene EA, Auciello O, Schultz JA. 2002. Appl. Phys. Lett. 80:3796-98
- (2002) Appl. Phys. Lett. , vol.80 , pp. 3796-3798
- Mueller, A.H.¹ Suvorova, N.A.² Irene, E.A.³ Auciello, O.⁴ Schultz, J.A.⁵

242
- 0001364261
- Lee J, Rovira PI, An I, Collins RW. 1998. Appl. Phys. Lett. 72:900-2
- (1998) Appl. Phys. Lett. , vol.72 , pp. 900-902
- Lee, J.¹ Rovira, P.I.² An, I.³ Collins, R.W.⁴

243
- 0031998604
- Galarza CG, Khargonekar PP, Layadi N, Vincent TL, Rietman EA, Lee JTC. 1998. Thin Solid Films 313:156-60
- (1998) Thin Solid Films , vol.313 , pp. 156-160
- Galarza, C.G.¹ Khargonekar, P.P.² Layadi, N.³ Vincent, T.L.⁴ Rietman, E.A.⁵ Lee, J.T.C.⁶

244
- 0035123046
- Klimecky P, Garvin C, Galarza CG, Stutzman BS, Khargonekar PP, Terry FL. 2001. J. Electrochem. Soc. 148:C34-40
- (2001) J. Electrochem. Soc. , vol.148
- Klimecky, P.¹ Garvin, C.² Galarza, C.G.³ Stutzman, B.S.⁴ Khargonekar, P.P.⁵ Terry, F.L.⁶

245
- 0036207595
- Rosen IG, Parent T, Fidan B, Wang CM, Madhukar A. 2002. IEEE Trans. Control Syst. Technol. 10:64-75
- (2002) IEEE Trans. Control Syst. Technol , vol.10 , pp. 64-75
- Rosen, I.G.¹ Parent, T.² Fidan, B.³ Wang, C.M.⁴ Madhukar, A.⁵

246
- 24644451259
- Cho SJ, Snyder PG. 1999. J. Vac. Sci. Technol. B 17:2045-49
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 2045-2049
- Cho, S.J.¹ Snyder, P.G.²

247
- 0038820927
- Vallon S, Joubert O, Vallier L, Ferrieu F, Drevillon B, Blayo N. 1997. J. Vac. Sci. Technol. A 15:865-70
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 865-870
- Vallon, S.¹ Joubert, O.² Vallier, L.³ Ferrieu, F.⁴ Drevillon, B.⁵ Blayo, N.⁶

248
- 0035421967
- Park HM, Grimard DS, Grizzle JW, Terry FL. 2001. IEEE Trans. Semicond. Manuf. 14:242-54
- (2001) IEEE Trans. Semicond. Manuf , vol.14 , pp. 242-254
- Park, H.M.¹ Grimard, D.S.² Grizzle, J.W.³ Terry, F.L.⁴

249
- 0000181401
- Maynard HL, Layadi N, Lee JTC. 1997. J. Vac. Sci. Technol. B 15:109-15
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 109-115
- Maynard, H.L.¹ Layadi, N.² Lee, J.T.C.³

250
- 0036124616
- Cho SJ, Snyder PG, Herzinger CM, Johs B. 2002. J. Vac. Sci. Technol. B 20:197-202
- (2002) J. Vac. Sci. Technol. B , vol.20 , pp. 197-202
- Cho, S.J.¹ Snyder, P.G.² Herzinger, C.M.³ Johs, B.⁴

251
- 0040158811
- Huang HT, Kong W, Terry FL. 2001. Appl. Phys. Lett. 78:3983-85
- (2001) Appl. Phys. Lett. , vol.78 , pp. 3983-3985
- Huang, H.T.¹ Kong, W.² Terry, F.L.³

252
- 0000498927
- Edwards NV, Bremser MD, Weeks TW, Kern RS, Davis RF, Aspnes DE. 1996. Appl. Phys. Lett. 69:2065-67
- (1996) Appl. Phys. Lett. , vol.69 , pp. 2065-2067
- Edwards, N.V.¹ Bremser, M.D.² Weeks, T.W.³ Kern, R.S.⁴ Davis, R.F.⁵ Aspnes, D.E.⁶

253
- 0343390487
- Edwards NV, Jarrendahl K, Aspnes DE, Robbie K, Powell GD, et al. 2000. Surf. Sc. 464:L703-7
- (2000) Surf. Sci. , vol.464
- Edwards, N.V.¹ Jarrendahl, K.² Aspnes, D.E.³ Robbie, K.⁴ Powell, G.D.⁵

254
- 0041553833
- Layadi N, Donnelly VM, Lee JTC, Klemens FP. 1997. J. Vac. Sci. Technol. A 15:604-9
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 604-609
- Layadi, N.¹ Donnelly, V.M.² Lee, J.T.C.³ Klemens, F.P.⁴

255
- 0034268805
- Mayer TM, de Boer MP, Shinn ND, Clews PJ, Michalske TA. 2000. J. Vac. Sci. Technol. B 18:2433-40
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 2433-2440
- Mayer, T.M.¹ De Boer, M.P.² Shinn, N.D.³ Clews, P.J.⁴ Michalske, T.A.⁵

256
- 0034276297
- Hu YZ, Sharangpani R, Tay SP. 2000. J. Vac. Sci. Technol. A 18:2527-32
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 2527-2532
- Hu, Y.Z.¹ Sharangpani, R.² Tay, S.P.³

257
- 0000931416
- Losurdo M, Capezzuto P, Bruno G, Irene EA. 1998. Phys. Rev. B 58:15878-88
- (1998) Phys. Rev. B , vol.58 , pp. 15878-15888
- Losurdo, M.¹ Capezzuto, P.² Bruno, G.³ Irene, E.A.⁴

258
- 0035273070
- Tinani M, Mueller A, Gao Y, Irene EA, Hu YZ, Tay SP. 2001. J. Vac. Sci. Technol. B 19:376-83
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 376-383
- Tinani, M.¹ Mueller, A.² Gao, Y.³ Irene, E.A.⁴ Hu, Y.Z.⁵ Tay, S.P.⁶

259
- 0033521293
- Brenot R, Vanderhaghen R, Drevillon B, Cabarrocas PRI. 1999. Appl. Phys. Lett. 74:58-60
- (1999) Appl. Phys. Lett. , vol.74 , pp. 58-60
- Brenot, R.¹ Vanderhaghen, R.² Drevillon, B.³ Cabarrocas, P.R.I.⁴

260
- 0036478681
- Hoffman RW, Ramer J, Li SM. 2002. Jpn. J. Appl. Phys. Part 1 41:996-99
- (2002) Jpn. J. Appl. Phys. Part 1 , vol.41 , pp. 996-999
- Hoffman, R.W.¹ Ramer, J.² Li, S.M.³

261
- 0034187465
- Bertness KA. 2000. J. Vac. Sci. Technol. B 18:1426-30
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 1426-1430
- Bertness, K.A.¹

262
- 0035272033
- Cardoso A, Srivastava AK. 2001. J. Vac. Sci. Technol. B 19:397-402
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 397-402
- Cardoso, A.¹ Srivastava, A.K.²

263
- 3943051445
- Wang ZZ, Kwan SL, Pearsall TP, Booth JL, Beard BT, Johnson SR. 1997. J. Vac. Sci. Technol. B 15:116-21
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 116-121
- Wang, Z.Z.¹ Kwan, S.L.² Pearsall, T.P.³ Booth, J.L.⁴ Beard, B.T.⁵ Johnson, S.R.⁶

264
- 0043057134
- Johnson S, Kuo CH, Boonzaayer M, Braun W, Koelle U, et al. 1998. J. Vac. Sci. Technol. B 16:1502-6
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 1502-1506
- Johnson, S.¹ Kuo, C.H.² Boonzaayer, M.³ Braun, W.⁴ Koelle, U.⁵

265
- 0041554108
- deLyon TJ, Roth JA, Chow DH. 1997. J. Vac. Sci. Technol. B 15:329-36
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 329-336
- DeLyon, T.J.¹ Roth, J.A.² Chow, D.H.³

266
- 0000057767
- Floro JA, Chason E, Lee SR, Twesten RD, Hwang RQ, Freund LB. 1997. J. Electron. Mater. 26:969-79
- (1997) J. Electron. Mater. , vol.26 , pp. 969-979
- Floro, J.A.¹ Chason, E.² Lee, S.R.³ Twesten, R.D.⁴ Hwang, R.Q.⁵ Freund, L.B.⁶

267
- 0035535356
- Beresford R, Tetz K, Yin J, Chason E, Gonzalez MU. 2001. J. Vac. Sci. Technol. B 19:1572-75
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 1572-1575
- Beresford, R.¹ Tetz, K.² Yin, J.³ Chason, E.⁴ Gonzalez, M.U.⁵

268
- 0035803187
- Rajamani A, Beresford R, Sheldon BW. 2001. Appl. Phys. Lett. 79:3776-78
- (2001) Appl. Phys. Lett. , vol.79 , pp. 3776-3778
- Rajamani, A.¹ Beresford, R.² Sheldon, B.W.³

269
- 0033703254
- Fitz C, Fukarek W, Kolitsch A, Moller W. 2000. Surf. Coat. Technol. 128:474-78
- (2000) Surf. Coat. Technol. , vol.128 , pp. 474-478
- Fitz, C.¹ Fukarek, W.² Kolitsch, A.³ Moller, W.⁴

270
- 0035398069
- Garcia JM, Gonzalez L, Gonzalez MU, Silveira JP, Gonzalez Y, Briones F. 2001. J. Cryst. Growth 227:975-79
- (2001) J. Cryst. Growth , vol.227 , pp. 975-979
- Garcia, J.M.¹ Gonzalez, L.² Gonzalez, M.U.³ Silveira, J.P.⁴ Gonzalez, Y.⁵ Briones, F.⁶

271
- 0001557174
- Kim BS, Avila L, Brus LE, Herman IP. 2000. Appl. Phys. Lett. 76:3715-17
- (2000) Appl. Phys. Lett. , vol.76 , pp. 3715-3717
- Kim, B.S.¹ Avila, L.² Brus, L.E.³ Herman, I.P.⁴

272
- 0000101263
- Raymond CJ, Murnane MR, Prins SL, Sohail S, Naqvi H, et al. 1997. J. Vac. Sci. Technol. B 15:361-68
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 361-368
- Raymond, C.J.¹ Murnane, M.R.² Prins, S.L.³ Sohail, S.⁴ Naqvi, H.⁵

273
- 0035336421
- Niu XH, Jakatdar N, Bao JW, Spanos CJ. 2001. IEEE Trans. Semicond. Manuf. 14:97-111
- (2001) IEEE Trans. Semicond. Manuf. , vol.14 , pp. 97-111
- Niu, X.H.¹ Jakatdar, N.² Bao, J.W.³ Spanos, C.J.⁴

274
- 79956028745
- Paul DP, Conrad EW, Cole DC, Barouch E. 2002. Appl. Phys. Lett. 80:4861-63
- (2002) Appl. Phys. Lett. , vol.80 , pp. 4861-4863
- Paul, D.P.¹ Conrad, E.W.² Cole, D.C.³ Barouch, E.⁴

275
- 0033712934
- Feke GD, Hessman D, Grober RD, Lu B, Taylor JW. 2000. J. Vac. Sci. Technol. B 18:136-39
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 136-139
- Feke, G.D.¹ Hessman, D.² Grober, R.D.³ Lu, B.⁴ Taylor, J.W.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.