Relative atomic chlorine density in inductively coupled plasmas containing chlorine and boron trichloride

Journal of Applied Physics

Volumn 83, Issue 10, 1998, Pages 5102-5107

  Hebner, G A ^a   Fleddermann, C B ^a,b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b University of New Mexico   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHLORINE; CHLORINE COMPOUNDS; DRY ETCHING; ELECTRIC DISCHARGES; FLUORESCENCE; LASER APPLICATIONS; MICROELECTRONICS; MIXTURES; NITROGEN; PHOTONS; PLASMA DENSITY;

BORON TRICHLORIDE; INDUCTIVELY COUPLED PLASMAS; LASER INDUCED FLUORESCENCE; RADIO FREQUENCY DISCHARGES;

PLASMAS;

EID: 0032072853     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367327     Document Type: Article

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