Pattern characterization of deep-ultraviolet photoresists by near-field infrared microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 1, 2001, Pages 142-152

  Dragnea, Bogdan ^a   Preusser, Jan ^a   Szarko, Jodi M ^a   Leone, Stephen R ^a   Hinsberg, William D ^b  

^a UNIVERSITY OF COLORADO   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; INFRARED RADIATION; LIGHT ABSORPTION; MICROSCOPIC EXAMINATION; NEAR FIELD SCANNING OPTICAL MICROSCOPY; OPTICAL RESOLVING POWER; POLYMETHYL METHACRYLATES; ULTRAVIOLET RADIATION;

DEEP-ULTRAVIOLET PHOTORESISTS; NEAR-FIELD INFRARED MICROSCOPY;

PHOTORESISTS;

EID: 0035083657     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1340662     Document Type: Article

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