Study of surface reactions during plasma enhanced chemical vapor deposition of SiO2 from SiH4, O2, and Ar plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2062-2070

  Han, Sang M ^a   Aydil, Eray S ^a  

^a University of California at Santa Barbara   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030494357     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580082     Document Type: Article

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