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Volumn 317, Issue 6, 2000, Pages 631-636
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Ultraviolet cavity ring-down spectroscopy of free radicals in etching plasmas
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0001666727
PISSN: 00092614
EISSN: None
Source Type: Journal
DOI: 10.1016/S0009-2614(99)01424-4 Document Type: Article |
Times cited : (41)
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References (30)
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