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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2751-2761

Spectroscopic study of plasma using zirconium tetra-tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide

(4) Cho, B O a Lao, S a Sha, L a Chang, J P a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; DIFFUSION IN GASES; DISSOCIATION; ELECTRIC CURRENTS; EMISSION SPECTROSCOPY; GRAPHITE; IONIZATION OF GASES; PERMITTIVITY; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STOICHIOMETRY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL EMISSION SPECTROSCOPY (OES);

ZIRCONIA;

EID: 0035508013 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1403717 Document Type: Article

Times cited : (37)

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