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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 I, 2000, Pages 1303-1307

Real time control of plasma deposited optical filters by multiwavelength ellipsometry

(4) Heitz, T a Hofrichter, A a Bulkin, P a Drevillon, B a

a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES (France)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG CELLS; ELECTRON CYCLOTRON RESONANCE; MULTILAYERS; OPTICAL FILTERS; OPTIMIZATION; PLASMA APPLICATIONS; PROCESS CONTROL; REAL TIME SYSTEMS; REFRACTIVE INDEX; SILICA; SILICON NITRIDE; VAPOR DEPOSITION;

FOUR-WAVELENGTH KINETIC ELLIPSOMETRY; FRESNEL COEFFICIENTS; MINIMIZATION ALGORITHMS;

ELLIPSOMETRY;

EID: 0034225960 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.582344 Document Type: Article

Times cited : (10)

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