Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4, 2000, Pages 1709-1712

  Vergohl M ^a   Hunsche, B ^a   Malkomes, N ^a   Matthee T ^a   Szyszka, B ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; FILM GROWTH; MAGNETRON SPUTTERING; MORPHOLOGY; NIOBIUM COMPOUNDS; OXIDES; PLASMA DIAGNOSTICS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION;

NIOBIUM PENTOXIDE; SPECTROELLIPSOMETRY;

OPTICAL FILMS;

EID: 0034229430     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582412     Document Type: Article

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