Ultrahigh frequency versus inductively coupled chlorine plasmas: Comparisons of Cl and Cl2 concentrations and electron temperatures measured by trace rare gases optical emission spectroscopy

Journal of Applied Physics

Volumn 84, Issue 3, 1998, Pages 1222-1230

  Malyshev, M V ^a,c   Donnelly, V M ^a   Samukawa, S ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b NEC CORPORATION   (Japan)

^c PRINCETON PLASMA PHYSICS LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001555452     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368820     Document Type: Review

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