Laser-induced fluorescence detection of SiF2 as a primary product of Si and SiO2 reactive ion etching with CF4 gas

Plasma Sources Science and Technology

Volumn 6, Issue 3, 1997, Pages 349-360

  Cunge, Gilles ^a   Chabert, Pascal ^a,b,c   Booth, Jean Paul ^a  

^a UNIV GRENOBLE ALPES   (France)

^b ONERA   (France)

^c THALES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INORGANIC COMPOUNDS; DESORPTION; FLUORESCENCE; GLOW DISCHARGES; REACTIVE ION ETCHING; SILICA; SILICON; SILICON COMPOUNDS;

LASER INDUCED FLUORESCENCE; PULSED CALCIUM TETRAFLUORIDE PLASMAS;

PLASMA ETCHING;

EID: 0031211723     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/6/3/012     Document Type: Article

References (43)

1. Heinecke R A 1975 Solid State Electron. 18 1146
2. Joubert O, Oehrlein G S and Surendra M 1994 J. Vac. Sci. Technol. A 12 665
3. Bell F H, Joubert O, Oehrlein G S, Zhang Y and Vender D 1994 J. Vac. Sci. Technol. A 12 3095
4. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
5. Pelletier J 1987 J. Phys. D: Appl. Phys. 20 858
6. Vanhaelemeersch S, Van Hoeymissen J, Vermeylen D and Peeters J 1991 J. Appl. Phys. 70 3892
7. Donnelly V M and Flamm D L 1980 J. Appl. Phys. 51 5273
8. Flamm D F, Donnelly V M and Mucha J A 1981 J. Appl. Phys. 52 3633
9. Vasile M J and Stevie F A 1982 J. Appl. Phys. 53 3799
10. Winters H F and Plumb I C 1991 J. Vac. Sci. Technol. B 9 197
11. Coburn J W and Winters H F 1979 J. Vac. Sci. Technol. 16
12. Winters H F and Houle F A 1983 J. Appl. Phys. 54 1218
13. Matsumi Y, Toyoda S, Hayashi T and Miyamura M 1986 J. Appl. Phys. 60 4102
14. Flamm D L, Mogab C J and Sklaver E R 1979 J. Appl. Phys. 50 6211
15. Winters H F 1983 J. Vac. Sci. Technol. B 1 927
16. Gray D C, Tepermeister I and Sawin H H 1993 J. Vac. Sci. Technol. 11 1243
17. Gray D C, Butterbaugh J and Sawin H H 1991 J. Vac. Sci. Technol. A 9 779
18. Tu Y, Chuang T J and Winters H F 1981 Phys. Rev. B 23 823
19. Winters H F and Coburn J W 1985 J. Vac. Sci. Technol. B 3 1376
20. Oostra D J, Haring A and De Vries A E 1986 J. Vac. Sci. Technol. B 4 1278
21. Sappey A D and Jeffries J B 1989 Unpublished results
22. Khanna V M, Besenbruch G and Margrave J L 1966 J. Chem. Phys. 46
23. Cai Z L and Bai J L 1993 Chem. Phys. 178 215
24. Booth J P and Hancock G 1988 Chem. Phys. Lett. 150 457
25. Cunge G, Booth J P and Derouard J 1996 Chem. Phys. Lett. 263 645
26. Neuilly F, Cunge G, Booth J P and Sadeghi N 1997 Proc. Frontiers in Low Temperature Plasma Diagnostics II (Bad Honnef 1997)
27. Hack W and Wilms A 1986 J. Phys. Chem. 90 4007
28. Arai T, Goto M, Asoh Y, Takayama D and Shimuzu T 1993 Japan. J. Appl. Phys. 32L 1469
29. Sugai H, Nakano T, Goto M, Nakamura K and Toyoda H 1993 Proc. 21st Int. Conf. on Phenomena in Ionized Gases vol 2
30. Booth J P and Hancock G 1993 Mater. Sci. Forum 140 219
31. Chantry P J 1987 J. Appl. Phys. 62 1141
32. Hancock G, Sucksmith J P and Toogood M T 1990 J. Phys. Chem. 94 3269
33. Braithwaite N S J, Booth J P and Cunge G 1996 Plasma Sources Sci. Technol. 5 677
34. Plumb I C and Ryan K R 1996 Plasma Chem. Plasma Proc. 6 205
35. Shul R J, Hayes T R, Wetzel R C, Baiocchi F A and Freund R S 1988 J. Chem. Phys. 89 4042
36. Plumb I C and Ryan K R 1986 Plasma Chem. Plasma Proc. 6 11
37. Peeters J 1997 private communication
38. Harding D R and Hussain D 1986 J. Chem. Soc. Faraday Trans. II 82 937
39. Walkup R, Avouris P, Dreyfus R W, Jasinski J M and Selwyn G S 1984 Appl. Phys. Lett. 45 372
40. Christophorou L G, Olthoff J K and Rao M V V S 1996 J. Phys. Chem. Ref. Data 25 1341
41. Weber M E and Armentrout P B 1989 J. Chem. Phys. 90 2213
42. Kickel B L, Fisher E R and Armentrout P B 1993 J. Phys. Chem. 97 10 198
43. Schwarzenbach W 1996 private communication