Optical emission studies and neutral stream characterization of a surface reflection materials processing source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 I, 2000, Pages 1359-1365

  Tang, Xianmin ^a   Manos, Dennis M ^a  

^a The College of William and Mary   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPOSITION EFFECTS; EMISSION SPECTROSCOPY; FLUOROCARBONS; LIGHT EMISSION; MATHEMATICAL MODELS; OXYGEN; PRESSURE EFFECTS;

NEUTRAL BEAMS; SPECTROSCOPIC ACTINOMETRY;

PLASMA SOURCES;

EID: 0034227943     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582354     Document Type: Article

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