Real-time stress evolution during Si1-xGex heteroepitaxy: Dislocations, islanding, and segregation

Journal of Electronic Materials

Volumn 26, Issue 9, 1997, Pages 969-979

  Floro, J A ^a   Chason, E ^a   Lee, S R ^a   Twesten, R D ^a   Hwang, R Q ^a   Freund, L B ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b BROWN UNIVERSITY   (United States)

Author keywords

Heteroepitaxy; Islanding; Roughening; SiGe; Strain relaxation; Surface segregation

Indexed keywords

EID: 0000057767     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-997-0233-2     Document Type: Article

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