Stability of HF-etched Si(100) surfaces in oxygen ambient

Applied Physics Letters

Volumn 79, Issue 24, 2001, Pages 4051-4053

  Zhang, X ^a   Garfunkel, E ^a   Chabal, Y J ^b   Christman, S B ^b   Chaban, E E ^b  

^a RUTGERS UNIVERSITY   (United States)

^b AGERE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035842813     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1425461     Document Type: Article

References (16)

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