Metastable chlorine ion kinetics in inductively coupled plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2698-2708

  Hebner, G A ^a   Fleddermann, C B ^a,b   Miller, P A ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b University of New Mexico   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHLORINE; ELECTRODES; FLUORESCENCE; KINETIC THEORY; LASER APPLICATIONS; PLASMAS; PROBES; TEMPERATURE MEASUREMENT; VELOCITY MEASUREMENT;

BIAS VOLTAGE; LANGMUIR PROBE; RADIAL DRIFT VELOCITY; RELATIVE NUMBER DENSITY;

IONS;

EID: 0031222445     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580944     Document Type: Article

References (43)

1. D. W. Hess and R. H. Bruce, in Dry Etching for Microelectronics, edited by R. A. Powel (North Holland, Amsterdam, 1984), Chap. 1.
2. B. J. Howard and Ch. Steinbruchel, J. Vac. Sci. Technol. A 12, 1259 (1994).
3. Y. Kusumi, N. Fujiwara, J. Matsumoto, and M. Yoneda, Jpn. J. Appl. Phys. 1 34, 2147 (1995).
4. W. F. Marx, D. X. Ma, and C. Chen, J. Vac. Sci. Technol. A 10, 1232 (1992).
5. C. Constantine, R. J. Shul, C. T. Sullivan, M. B. Snipes, G. B. McClellan, M. Hafich, C. T. Fuller, J. R. Mileham, and S. J. Pearton, J. Vac. Sci. Technol. B 13, 2025 (1995).
6. J. Hopwood, Plasma Sources Sci. Technol. 1, 109 (1992).
7. P. A. Miller, G. A. Hebner, K. E. Greenberg, P. D. Pochan, and B. P. Aragon, J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995).
8. J. Hopwood, C. R. Guarnieri, S. J. Whitehair, and J. J. Cuomo, J. Vac. Sci. Technol. A 11, 152 (1993).
9. J. H. Keller, J. C. Foster, and M. S. Barnes, J. Vac. Sci. Technol. A 11, 2487 (1993).
10. J. A. Meyer and A. E. Wendt, J. Appl. Phys. 78, 90 (1995).
11. L. J. Mahoney, A. E. Wendt, E. Barrios, C. J. Richards, and J. L. Shohet, J. Appl. Phys. 76, 2041 (1994).
12. U. Kortshagen, I. Pukropski, and L. D. Tsendin, Phys. Rev. E 51, 6063 (1995).
13. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, Plasma Sources Sci. Technol. 3, 169 (1994).
14. R. J. Hoekstra and M. J. Kushner, J. Appl. Phys. 79, 2275 (1996).
15. V. Vahedi, M. A. Lieberman, G. DiPeso, T. D. Rognilien, and D. Hewett, J. Appl. Phys. 78, 1 (1995).
16. R. A. Stewart, P. Vitello, D. B. Graves, E. F. Jaeger, and L. A. Berry, Plasma Sources Sci. Technol. 4, 36 (1995).
17. J. Johannes, T. Bartel, G. A. Hebner, R. Wise, and D. J. Economou, J. Electrochem. Soc. (accepted).
18. J. A. Stockdale, D. R. Nelson, F. J. Davis, and R. N. Compton, J. Chem. Phys. 56, 3336 (1972).
19. Z. Lj. Petrovic, W. C. Wang, M. Suto, J. C. Han, and L. C. Lee, J. Appl. Phys. 67, 675 (1990).
20. R. Nagpal and A. Garscadden, Appl. Phys. Lett. 64, 1626 (1994).
21. D. L. Mosteller, Jr., M. L. Andrews, J. D. Clark, and A. Garscadden, J. Appl. Phys. 74, 2247 (1993).
22. D. A. Lapiano-Smith and F. R. McFreely, J. Appl. Phys. 72, 4907 (1992).
23. J. R. Woodworth, M. E. Riley, and B. P. Aragon, 43rd Annual American Vacuum Society Symposium, Philadelphia, Pennsylvania, 14-18 Oct. 1996, abstract PS-WeP17.
24. L. J. Overzet and L. Luo, Appl. Phys. Lett. 59, 161 (1991).
25. R. A. Gottscho and C. E. Gaebe, IEEE Trans. Plasma Sci. PS-14, 92 (1986).
26. G. A. Hebner, J. Vac. Sci. Technol. A 14, 2158 (1996).
27. C. B. Fleddermann and G. A. Hebner, J. Vac. Sci. Technol. A 15, 1955 (1997).
28. G. A. Hebner, J. Appl. Phys. 80, 3215 (1996).
29. T. Nakano, N. Sadeghi, D. J. Trevor, R. A. Gottscho, and R. W. Boswell, J. Appl. Phys. 72, 3384 (1992).
30. G. R. Scheller, R. A. Gottscho, T. Intrator, and D. B. Graves, J. Appl. Phys. 64, 4384 (1988).
31. G. A. Hebner, J. Appl. Phys. 81, 578 (1997).
32. L. A. Farrow, J. Chem. Phys. 82, 3625 (1985).
33. N. L. Bassett and D. J. Economou, J. Appl. Phys. 75, 1931 (1994).
34. F. W. Breitbarth, Plasma Chem. Plasma Process. 12, 261 (1992).
35. G. A. Hebner, J. Appl. Phys. 80, 2624 (1996).
36. J. R. Woodworth, M. E. Riley, D. C. Meister, B. P. Aragon, M. S. Le, and H. H. Sawin, J. Appl. Phys. 80, 1304 (1996).
37. J. R. Woodworth, M. E. Riley, P. A. Miller, G. A. Hebner, and T. W. Hamilton, J. Appl. Phys. 81, 5950 (1997).
38. U. Kortshagen and M. Zethoff, Plasma Sources Sci. Technol. 4, 541 (1995).
39. F. Chatain, J. Derouard, and N. Sadeghi, 48th Gaseous Electronics Conference, Berkeley, CA, 1995 October 9-13, Paper HB-3.
40. R. M. Forrister and H. M. Anderson, 48th Gaseous Electronics Conference, Berkeley, CA, 1995, October 9-13, Paper EA-8.
41. CRC Handbook of Chemistry and Physics, edited by D. R. Lide (Chemical, Boca Raton, 1995), pp. 9-53.
42. V. H. Dibeler and J. A. Walker, Inorg. Chem. 8, 50 (1969).
43. J. R. Woodworth, B. P. Aragon, and T. W. Hamilton, Appl. Phys. Lett. 70, 1947 (1997).