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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 1, 2002, Pages 43-52

Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor

(6) Ullal, Saurabh J a Godfrey, Anna R a Edelberg, Erik b Braly, Linda b Vahedi, Vahid b Aydil, Eray S a

a University of California (United States)

b LAM RESEARCH CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL REACTORS; CHLORINE; COMPOSITION; DEPOSITION; DIFFUSION; EMISSION SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PLASMA DEVICES; SILICA; SURFACE REACTIONS;

ACTINOMETRY; CHAMBER WALL; INDUCTIVELY COUPLED PLASMA REACTOR; MOLE FRACTIONS; PLASMA COMPOSITION;

PLASMA DIAGNOSTICS;

EID: 0036162520 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1421602 Document Type: Article

Times cited : (108)

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