Multiparameter grating metrology using optical scatterometry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 2, 1997, Pages 361-368

  Raymond, Christopher J ^a   Murnane, Michael R ^a   Prins, Steven L ^a   Sohail, S ^a   Naqvi, H ^a,c   McNeil, John R ^a   Hosch, Jimmy W ^b,d  

^a University of New Mexico   (United States)

^b SEMATECH   (United States)

^c GIK INSTITUTE OF ENGINEERING SCIENCES AND TECHNOLOGY   (Pakistan)

^d TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000101263     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589320     Document Type: Article

References (26)

1. The National Technology Roadmap for Semiconductors (Semiconductor Industry Association, 1994).
2. S. Wittekoek et al., Proc. SPIE 565, 22 (1985).
3. R. Pforr et al., Optical/Laser Microlithography V, Proc. SPIE 1674, 594 (1992).
4. M. P. Lang, M. S., University of New Mexico (1992).
5. L. M. Milner, K. P. Bishop, S. S. H. Naqvi, and J. R. McNeil, J. Vac. Sci. Technol. B 11, 1258 (1993).
6. K. C. Hickman et al., J. Vac. Sci. Technol. B 10, 2259 (1992).
7. J. Sturtevant, S. Holmes, and P. Rabidoux, Advances in Resist Technology and Processing IX. Proc. SPIE 1672, 114 (1992).
8. J. R. McNeil et al., Microlithography World 1, 16 (1992).
9. M. G. Moharam, T. K. Gaylord, G. T. Sincerbox, H. Werlich, and B. Yung, Appl Opt. 23, 3214 (1984).
10. M. R. Murnane, C. J. Raymond, Z. R. Hatab, S. S. H. Naqvi, and J. R. McNeil, Integrated Circuit Metrology, Inspection and Process Control VIII, Proc. SPIE 2196, 47 (1994).
11. S. S. H. Naqvi et al., J. Opt. Soc. Am. A 11, 2485 (1994).
12. S. S. H. Naqvi, J. R. McNeil, R. H. Krukar, and K. P. Bishop, Microlithography World 2 (1993).
13. T. K. Gaylord and M. G. Moharram, Proc. IEEE 73, 894 (1985).
14. C. J. Raymond, M. R. Murnane, S. H. Naqvi, and J. R. McNeil, SPIE Microelectronics Manufacturing, Proc. SPIE 2336, 37 (1994).
15. M. R. Murnane, C. J. Raymond, S. L. Prins, S. S. H. Naqvi, and J. R. McNeil, Integrated Circuit Metrology, Inspection and Process Control IX, Proc. SPIE 2439, 427 (1995).
16. C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, J. Vac. Sci. Technol. B 13, 1484 (1995).
17. O. C. Wells, Appl. Phys. Lett. 49, 764 (1986).
18. A. Sicignano and M. Vaez-Iravani, Scanning 10, 201 (1988).
19. M. T. Postek, W. J. Keery, and R. D. Larrabee, Scanning 11, 111 (1989).
20. M. T. Postek, W. J. Keery, and R. D. Larrabee, Scanning 10, 10 (1988).
21. K. M. Monahan (personal communication, February 1996).
22. J. W. Nunn, Scanning 17, 296 (1995).
23. J. R. Lowney, Scanning 17, 281 (1995).
24. K. M. Monahan, Integrated Circuit Metrology, Inspection and Process Control IX 2439, 325 (1995).
25. T. Yamaguchi, S. Kawata, S. Suzuki, T. Sato, and Y. Sato, Jpn. J. Appl. Phys. Part I 32 6277 (1993).
26. R. R. Hershey and R. C. Elliott, Integrated Circuit Metrology, Inspection and Process Control IX 2439, 363 (1995).