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Volumn 75, Issue 26, 1999, Pages 4162-4164

The generation and detection of high flux atomic oxygen for physical vapor deposition thin film growth

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000552364     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125569     Document Type: Article
Times cited : (22)

References (18)
  • 15
    • 22244489232 scopus 로고    scopus 로고
    • note
    • MO is the flux of molecular oxygen entering the FTMP source calculated from the flow monitor.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.