Real-time ultraviolet ellipsometry monitoring of gate patterning in a high-density plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 865-870

  Vallon, S ^a,d   Joubert, O ^a,d   Vallier, L ^a,d   Ferrieu, F ^a   Drevillon B ^b   Blayo, N ^c  

^a ORANGE LABS   (France)

^b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^c ISA Jobin Yvon   (France)

^d INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038820927     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580722     Document Type: Article

References (12)

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