Improvements in wafer temperature measurements

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 2, 2001, Pages 397-402

  Cardoso, A ^a   Srivastava, A K ^a  

^a AXCELIS TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROSTATICS; HEAT RESISTANCE; HEAT TRANSFER; INTERFACES (MATERIALS); SILICON WAFERS; SPECTROSCOPY;

DIFFUSE REFLECTANCE MEASUREMENT; GAS CUSHION THERMOCOUPLE; THERMAL CONTACT RESISTANCE; WAFER TEMPERATURE MEASUREMENT;

TEMPERATURE MEASUREMENT;

EID: 0035272033     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1358857     Document Type: Article

References (7)

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