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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volumn 20, Issue 4, 2002, Pages 1395-1397
Characterization of cubic boron nitride growth using UV-extended real-time spectroscopic ellipsometry: Effect of plasma additions and dynamic substrate bias steps
(3)
Zapien, J A
a
Collins, R W
a
Messier, R
a
a
PENNSYLVANIA STATE UNIVERSITY
(
United States
)
Author keywords
[No Author keywords available]
Indexed keywords
CHARACTERIZATION; ELLIPSOMETRY; FILM GROWTH; HYDROGEN; OPTICAL PROPERTIES; OXYGEN; PHASE TRANSITIONS; PLASMAS; SILICON; SPUTTER DEPOSITION; THIN FILMS; ULTRAVIOLET SPECTROSCOPY;
FILM DEPOSITION; INFRARED TRANSMISSION SPECTROSCOPY; PULSED DC SPUTTERING; SUBSTRATE BIAS; ULTRAVIOLET EXTENDED REAL TIME SPECTROSCOPIC ELLIPSOMETRY;
CUBIC BORON NITRIDE;
EID
:
0036649064
PISSN
:
07342101
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1116/1.1486226
Document Type
:
Article
Times cited : (
12
)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
