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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 2, 1997, Pages 230-237

Two-dimensional imaging of CF2 density by laser-induced fluorescence in CF4 etching plasmas in the gaseous electronics conference reference cell

(2) McMillin, Brian K a,b Zachariah, Michael R a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b LAM RESEARCH CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031491504 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.580517 Document Type: Article

Times cited : (22)

References (33)

1
- 0004255148
- Academic, Boston
- Plasma Etching. An Introduction, edited by D. M. Manos and D. L. Flamm (Academic, Boston, 1989).
- (1989) Plasma Etching. An Introduction
- Manos, D.M.¹ Flamm, D.L.²

2
- 0003730831
- Wiley, New York
- M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Marerials Processing (Wiley, New York, 1994).
- (1994) Principles of Plasma Discharges and Marerials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

3
- 0001545085
- B. K. McMillin and M. R. Zachariah, J. Appl. Phys. 77, 5538 (1995).
- (1995) J. Appl. Phys. , vol.77 , pp. 5538
- McMillin, B.K.¹ Zachariah, M.R.²

4
- 0029732254
- B. K. McMillin and M. R. Zachariah, J. Appl. Phys. 79, 77 (1996).
- (1996) J. Appl. Phys. , vol.79 , pp. 77
- McMillin, B.K.¹ Zachariah, M.R.²

5
- 36449001969
- P. J. Hargis, Jr., K. E. Greenberg, P. A. Miller, J. B. Gerardo, J. R. Torezynski, M. E. Riley, G. A. Hebner, J. R. Roberts, J. K. Olthoff, J. R. Whetstone, R. J. Van Brunt, M. A. Sobolewski, H. M. Anderson, M. P. Splichal, J. L. Mock, P. Bletzinger, A. Garscadden, R. A. Gottscho, G. Selwyn, M. Dalvie, J. E. Heidenreich, J. W. Butterbaugh, M. L. Brake, M. L. Passow, J. Pender, A. Lujan, M. E. Elta, D. B. Graves, H. H. Sawin, J. J. Kushner, J. T. Verdeyen, R. Horwath, and T. R. Turner, Rev. Sci. Instrum. 65, 140 (1994).
- (1994) Rev. Sci. Instrum. , vol.65 , pp. 140
- Hargis Jr., P.J.¹ Greenberg, K.E.² Miller, P.A.³ Gerardo, J.B.⁴ Torezynski, J.R.⁵ Riley, M.E.⁶ Hebner, G.A.⁷ Roberts, J.R.⁸ Olthoff, J.K.⁹ Whetstone, J.R.¹⁰ Van Brunt, R.J.¹¹ Sobolewski, M.A.¹² Anderson, H.M.¹³ Splichal, M.P.¹⁴ Mock, J.L.¹⁵ Bletzinger, P.¹⁶ Garscadden, A.¹⁷ Gottscho, R.A.¹⁸ Selwyn, G.¹⁹ Dalvie, M.²⁰ more..

6
- 0027612135
- Y. Hikosaka and H. Sugai, Jpn. J. Appl. Phys. 32, 3040 (1993); see also Y. Hikosaka, M. Nakamura, and H. Sugai, Jpn. J. Appl. Phys. 33, 2157 (1994), and references therein.
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 3040
- Hikosaka, Y.¹ Sugai, H.²

7
- 0028404972
- and references therein
- Y. Hikosaka and H. Sugai, Jpn. J. Appl. Phys. 32, 3040 (1993); see also Y. Hikosaka, M. Nakamura, and H. Sugai, Jpn. J. Appl. Phys. 33, 2157 (1994), and references therein.
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 2157
- Hikosaka, Y.¹ Nakamura, M.² Sugai, H.³

8
- 0001524322
- J. Wormhoudt, J. Vac. Sci. Technol. A 8, 1722 (1990).
- (1990) J. Vac. Sci. Technol. A , vol.8 , pp. 1722
- Wormhoudt, J.¹

9
- 21144470846
- H. C. Sun, V. Patel, E. A. Whittaker, B. Singh, and J. H. Thomas III, J. Vac. Sci. Technol. A 11, 1193 (1993).
- (1993) J. Vac. Sci. Technol. A , vol.11 , pp. 1193
- Sun, H.C.¹ Patel, V.² Whittaker, E.A.³ Singh, B.⁴ Thomas III, J.H.⁵

10
- 0027641933
- and references therein
- K. Takahashi, M. Hori, and T. Goto, Jpn. J. Appl. Phys. 32, L1088 (1993), and references therein.
- (1993) Jpn. J. Appl. Phys. , vol.32
- Takahashi, K.¹ Hori, M.² Goto, T.³

11
- 0029308672
- D. B. Oh, A. C. Stanton, H. M. Anderson, and M. P. Splichal, J. Vac. Sci. Technol. B 13, 954 (1995).
- (1995) J. Vac. Sci. Technol. B , vol.13 , pp. 954
- Oh, D.B.¹ Stanton, A.C.² Anderson, H.M.³ Splichal, M.P.⁴

12
- 0003863966
- P. J. Hargis, Jr. and M. J. Kushner, Appl. Phys. Lett. 40, 779 (1982).
- (1982) Appl. Phys. Lett. , vol.40 , pp. 779
- Hargis Jr., P.J.¹ Kushner, M.J.²

13
- 0020920215
- S. Pang and S. R. J. Brueck, Mater. Res. Soc. Symp. Proc. 17, 161 (1983).
- (1983) Mater. Res. Soc. Symp. Proc. , vol.17 , pp. 161
- Pang, S.¹ Brueck, S.R.J.²

14
- 0000752246
- Y. Matsumi, S. Toyoda, T. Hayashi, and M. Miyamura, J. Appl. Phys. 60, 4102 (1986).
- (1986) J. Appl. Phys. , vol.60 , pp. 4102
- Matsumi, Y.¹ Toyoda, S.² Hayashi, T.³ Miyamura, M.⁴

15
- 84913420310
- K. Ninomiya, K. Suzuki, S. Nishimatsu, and O. Okada, J. Vac. Sci. Technol. A4, 1791 (1986).
- (1986) J. Vac. Sci. Technol. , vol.A4 , pp. 1791
- Ninomiya, K.¹ Suzuki, K.² Nishimatsu, S.³ Okada, O.⁴

16
- 36549096060
- J. W. Thoman, Jr., K. Suzuki, S. H. Kable, and J. I. Steinfeld, J. Appl. Phys. 60, 2775 (1986).
- (1986) J. Appl. Phys. , vol.60 , pp. 2775
- Thoman Jr., J.W.¹ Suzuki, K.² Kable, S.H.³ Steinfeld, J.I.⁴

17
- 0001093529
- J. P. Booth, G. Hancock, and N. D. Perry, Appl. Phys. Lett. 50, 318 (1987); see also J. P. Booth, G. Hancock, N. D. Perry, and M. J. Toogood, J. Appl. Phys. 66, 5251 (1989).
- (1987) Appl. Phys. Lett. , vol.50 , pp. 318
- Booth, J.P.¹ Hancock, G.² Perry, N.D.³

18
- 36549100100
- J. P. Booth, G. Hancock, and N. D. Perry, Appl. Phys. Lett. 50, 318 (1987); see also J. P. Booth, G. Hancock, N. D. Perry, and M. J. Toogood, J. Appl. Phys. 66, 5251 (1989).
- (1989) J. Appl. Phys. , vol.66 , pp. 5251
- Booth, J.P.¹ Hancock, G.² Perry, N.D.³ Toogood, M.J.⁴

19
- 0001932504
- M. Kitamura, H. Akiya, and T. Urisu, J. Vac. Sci. Technol. B 7, 14 (1989).
- (1989) J. Vac. Sci. Technol. B , vol.7 , pp. 14
- Kitamura, M.¹ Akiya, H.² Urisu, T.³

20
- 0000250497
- and references therein
- S. G. Hansen, G. Luckman, G. C. Nieman, and S. D. Colson, J. Appl. Phys. 68, 2013 (1990), and references therein.
- (1990) J. Appl. Phys. , vol.68 , pp. 2013
- Hansen, S.G.¹ Luckman, G.² Nieman, G.C.³ Colson, S.D.⁴

21
- 0001447476
- L. D. B. Kiss, J.-P. Nicolai, W. T. Conner, and H. H. Sawin, J. Appl. Phys. 71, 3186 (1992).
- (1992) J. Appl. Phys. , vol.71 , pp. 3186
- Kiss, L.D.B.¹ Nicolai, J.-P.² Conner, W.T.³ Sawin, H.H.⁴

22
- 33847535991
- M. A. Sobolewski, J. Vac. Sci. Technol. A 10, 3550 (1992).
- (1992) J. Vac. Sci. Technol. A , vol.10 , pp. 3550
- Sobolewski, M.A.¹

23
- 0003762038
- edited by R. K. Marcus Plenum, New York
- B. L. Preppernau and T. A. Miller, in Glow Discharge Spectroscopies, edited by R. K. Marcus (Plenum, New York, 1993).
- (1993) Glow Discharge Spectroscopies
- Preppernau, B.L.¹ Miller, T.A.²

24
- 0025449147
- R. K. Hanson, J. M. Seitzman, and P. H. Paul, Appl. Phys. B 50, 441 (1990).
- (1990) Appl. Phys. B , vol.50 , pp. 441
- Hanson, R.K.¹ Seitzman, J.M.² Paul, P.H.³

25
- 0002431982
- D. S. King, P. K. Schenck, and J. C. Stephenson, J. Mol. Spectrosc. 78, 1 (1979).
- (1979) J. Mol. Spectrosc. , vol.78 , pp. 1
- King, D.S.¹ Schenck, P.K.² Stephenson, J.C.³

26
- 49049128876
- W. Hack and W. Langel, J. Photochem. 21, 105 (1983).
- (1983) J. Photochem. , vol.21 , pp. 105
- Hack, W.¹ Langel, W.²

27
- 0010607940
- W. Hack and A. Wilms, J. Phys. Chem. 90, 4007 (1986).
- (1986) J. Phys. Chem. , vol.90 , pp. 4007
- Hack, W.¹ Wilms, A.²

28
- 0004179874
- Wiley, New York
- J. D. Jackson, Classical Electrodynamics, 2nd ed. (Wiley, New York, 1975).
- (1975) Classical Electrodynamics, 2nd Ed.
- Jackson, J.D.¹

29
- 85033178257
- Aug. 21-25, Minneapolis, MN
- M. Surendra and C. R. Guarnieri, presented at the Workshop on Industrial Applications of Plasma Processing, 12th International Symp. on Plasma Chem., Aug. 21-25, Minneapolis, MN (1995).
- (1995) Workshop on Industrial Applications of Plasma Processing, 12th International Symp. on Plasma Chem.
- Surendra, M.¹ Guarnieri, C.R.²

30
- 0000246867
- I. C. Plumb and K. R. Ryan, Plasma Chem. Plasma Proc. 6, 205 (1986).
- (1986) Plasma Chem. Plasma Proc. , vol.6 , pp. 205
- Plumb, I.C.¹ Ryan, K.R.²

31
- 0000267513
- K. Tachibana, Phys. Rev. A 34, 1007 (1986).
- (1986) Phys. Rev. A , vol.34 , pp. 1007
- Tachibana, K.¹

32
- 0027004853
- W. L. Morgan, Plasma Chem. Plasma Proc. 12, 477 (1992).
- (1992) Plasma Chem. Plasma Proc. , vol.12 , pp. 477
- Morgan, W.L.¹

33
- 0343116831
- M. Dalvie and K. F. Jensen, J. Vac. Sci. Technol. A 8, 1648 (1990).
- (1990) J. Vac. Sci. Technol. A , vol.8 , pp. 1648
- Dalvie, M.¹ Jensen, K.F.²

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