The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1248-1253

  Ito, Natsuko ^a   Moriya, Tsuyoshi ^a   Uesugi, Fumihiko ^a   Moriya, Shuji ^b   Aomori, Masaru ^b   Kato, Yoshinori ^b   Tachibana, Mitsuhiro ^b  

^a NEC CORPORATION   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CLOUDS; FILM GROWTH; LIGHT SCATTERING; SILICON WAFERS; SURFACE ROUGHNESS; TUNGSTEN COMPOUNDS;

LASER LIGHT SCATTERING METHOD; RAREFIED PARTICLE CLOUDS;

CONDITION MONITORING;

EID: 0035393131     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1365127     Document Type: Article

References (10)