Chemical vapor deposition of fluoroalkylsilane monolayer films for adhesion control in microelectromechanical systems

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 5, 2000, Pages 2433-2440

  Mayer, T M ^a   De Boer, M P ^a   Shinn, N D ^a   Clews, P J ^a   Michalske, T A ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FILM PREPARATION; FLUOROCARBONS; INTERFACES (MATERIALS); MICROELECTROMECHANICAL DEVICES; MONOLAYERS; POLYCRYSTALLINE MATERIALS; SYNTHESIS (CHEMICAL);

FLUOROALKYLSILANE MONOLAYER FILMS;

SEMICONDUCTING FILMS;

EID: 0034268805     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1288200     Document Type: Article

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