Comparison of electromagnetic scattering measurements to simulation for microelectronic structures

Applied Physics Letters

Volumn 80, Issue 25, 2002, Pages 4861-4863

  Paul, David P ^a   Conrad, Edward W ^b   Cole, Daniel C ^c   Barouch, Eytan ^c  

^a EMIT Systems   (United States)

^b IBM MICROELECTRONICS   (United States)

^c BOSTON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC SCATTERING; IN-SITU; MANUFACTURABILITY; MICROCHIP TECHNOLOGIES; REAL TIME;

ATOMIC FORCE MICROSCOPY; MICROELECTRONICS; SCANNING ELECTRON MICROSCOPY;

ELECTROMAGNETISM;

EID: 79956028745     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1489708     Document Type: Article

References (9)

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