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Volumn 7, Issue 3, 1998, Pages 423-430

Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ALUMINUM COMPOUNDS; CARBON INORGANIC COMPOUNDS; FLUORINE COMPOUNDS; LIGHT ABSORPTION; SILICON COMPOUNDS; SULFUR; ULTRAVIOLET SPECTROSCOPY;

EID: 0032137652     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/7/3/021     Document Type: Article
Times cited : (85)

References (31)
  • 21
    • 0001173514 scopus 로고    scopus 로고
    • private communication
    • Porter T L, Mann D E and Acquista N 1965 J. Mol. Spectrosc. 16 228 McKendrick K G, private communication
    • McKendrick, K.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.