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Volumn 7, Issue 3, 1998, Pages 423-430
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Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION SPECTROSCOPY;
ALUMINUM COMPOUNDS;
CARBON INORGANIC COMPOUNDS;
FLUORINE COMPOUNDS;
LIGHT ABSORPTION;
SILICON COMPOUNDS;
SULFUR;
ULTRAVIOLET SPECTROSCOPY;
ALUMINUM FLUORIDE;
CARBON DIFLUORIDE;
CARBON FLUORIDE;
SILICON DIFLUORIDE;
PLASMA ETCHING;
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EID: 0032137652
PISSN: 09630252
EISSN: None
Source Type: Journal
DOI: 10.1088/0963-0252/7/3/021 Document Type: Article |
Times cited : (85)
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References (31)
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