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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 2017-2024

In situ characterization of thin film growth: Boron nitride on silicon

(1) Fukarek, W a

a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

Author keywords

BN

Indexed keywords

EID: 0012066920 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.1372908 Document Type: Conference Paper

Times cited : (10)

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