In-Situ FTIR Studies of Reactions at the Silicon/Liquid Interface: Wet Chemical Etching of Ultrathin SiO2 on Si(100)

Journal of Physical Chemistry B

Volumn 105, Issue 18, 2001, Pages 3903-3907

  Queeney, K T ^a,b   Fukidome, H ^a   Chaban, E E ^a   Chabal, Y J ^a  

^a AGERE SYSTEMS   (United States)

^b SMITH COLLEGE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MULTIPLE INTERNAL REFLECTION TECHNIQUES; WET CHEMICAL ETCHING;

ELECTROCHEMISTRY; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; HYDROXYLATION; LIQUIDS; MOLECULAR VIBRATIONS; PROBES; SILICA; SILICON; ULTRATHIN FILMS;

INTERFACES (MATERIALS);

EID: 0035838017     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp003409j     Document Type: Article

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