Vertical nanostructure arrays by plasma etching for applications in biology, energy, and electronics

Nano Today

Volumn 8, Issue 3, 2013, Pages 265-289

  He, B ^a   Yang, Y ^a   Yuen, M F ^a   Chen, X F ^a   Lee, C S ^a   Zhang, W J ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Biology; Electronics; Energy; Plasma etching (reactive ion etching); Vertical nanostructure arrays (VNAs)

Indexed keywords

BIOLOGY; DRUG DELIVERY; ELECTRONIC EQUIPMENT; NANOSTRUCTURES; SEMICONDUCTOR DEVICE MANUFACTURE;

BIOMIMETIC STRUCTURES; CONVENTIONAL TECHNIQUES; DIVERSE FIELDS; ENERGY; NANO-SCALE PATTERNS; NANOSTRUCTURE ARRAYS; PLASMA ETCHING PROCESS; SEMICONDUCTOR INDUSTRY;

PLASMA ETCHING;

BORON DERIVATIVE; CARBON; CUBIC BORON NITRIDE; DIAMOND; GLASS; NANOMATERIAL; SILICON CARBIDE; SILICON DIOXIDE; UNCLASSIFIED DRUG;

BIOLOGY; BIOMIMETICS; BIOSENSOR; DRUG DELIVERY SYSTEM; ELECTRONICS; ENERGY; FIELD EMISSION; NANOARRAY; NANOFABRICATION; NANOTECHNOLOGY; PLASMA; RAMAN SPECTROMETRY; REVIEW; SCANNING PROBE MICROSCOPY; SEMICONDUCTOR;

EID: 84879887363     PISSN: 17480132     EISSN: 1878044X     Source Type: Journal    
DOI: 10.1016/j.nantod.2013.04.008     Document Type: Review

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