Nanopillars by cesium chloride self-assembly and dry etching

Nanotechnology

Volumn 21, Issue 46, 2010, Pages

  Liao, Y X ^a   Yi, F T ^a  

^a INSTITUTE OF HIGH ENERGY PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE DIAMETER; CESIUM CHLORIDE; COVERAGE RATIO; HIGH ASPECT RATIO; MIXED STRUCTURE; NANOPILLARS; TUNABILITIES; UNIFORM COVERAGE;

CESIUM; CESIUM COMPOUNDS; CHLORINE COMPOUNDS; ELECTROMAGNETIC INDUCTION; INDUCTIVELY COUPLED PLASMA; LIGHT EMITTING DIODES; PLASMA ETCHING; SELF ASSEMBLY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

ASPECT RATIO;

EID: 78650100626     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/46/465302     Document Type: Article

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