Fabrication of submicron scale vertically aligned diamond rods by mask-free oxygen plasma etching

Diamond and Related Materials

Volumn 20, Issue 7, 2011, Pages 922-926

  Lin, Jian You ^a   Li, Zhai Chih ^a   Chen, Chih Yen ^a   Chou, Li Jen ^a   Hwang, Jenn Chang ^a   Kou, Chwung Shan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Diamond rods; Plasma etching; Submicron

Indexed keywords

DIAMOND SURFACES; ETCHING PROCESS; IRON ATOMS; MICRON SIZE; OXYGEN PLASMA ETCHING; OXYGEN PLASMAS; PLASMA ETCHING PROCESS; POLYCRYSTALLINE DIAMONDS; RADIO-FREQUENCY POWER; SUBMICRON; SUBMICRON SCALE; SUBSTRATE HOLDERS; VERTICALLY ALIGNED; X-RAY PHOTOEMISSIONS;

AUGER ELECTRON SPECTROSCOPY; EMISSION SPECTROSCOPY; OXYGEN; PLASMA ETCHING; PLASMAS; TRANSMISSION ELECTRON MICROSCOPY;

DIAMONDS;

EID: 79960784652     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2011.05.005     Document Type: Article

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