Periodic arrays of deep nanopores made in silicon with reactive ion etching and deep UV lithography

Nanotechnology

Volumn 19, Issue 14, 2008, Pages

  Woldering, Léon A ^a   Willem Tjerkstra, R ^a   Jansen, Henri V ^a   Setija, Irwan D ^b   Vos, Willem L ^a,c  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b ASML   (Netherlands)

^c FOM INSTITUTE AMOLF   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTALLINE MATERIALS; LITHOGRAPHY; OPTIMIZATION; SILICON;

CRYSTALLINE SILICON; LIQUID WETTING;

NANOPORES;

CHROMIUM; ION; NANOPARTICLE; SILICON;

ARTICLE; CHEMICAL STRUCTURE; CRYSTAL; ELECTRONICS; EXPERIMENTATION; LIQUID; OPTICS; PARTICLE SIZE; PHOTON; POROSITY; PRIORITY JOURNAL; PROCESSING; SEMICONDUCTOR; SENSOR; THEORETICAL STUDY; ULTRAVIOLET RADIATION; WETTABILITY;

EID: 41049101701     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/14/145304     Document Type: Article

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