Microcompression of fused silica nanopillars synthesized using reactive ion etching

Nanoscience and Nanotechnology Letters

Volumn 2, Issue 4, 2010, Pages 344-347

  Han, Seung Min ^a   Xie, Chong ^b   Cui, Yi ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Stanford University   (United States)

Author keywords

Amorphous; Fused Silica; Microcompression; Nanoindentation; Nanopillar; Reactive Ion Etching

Indexed keywords

AMORPHOUS; AVERAGE YIELD; FLOW STRESS; HIGH STRENGTH; HOMOGENEOUS DEFORMATION; MICROCOMPRESSION; NANOPILLAR; NANOPILLARS; REACTIVE ION; SEM MICROGRAPHS; SERRATED FLOW; STRAIN RESPONSE;

DEFORMATION; IONS; MECHANICAL PROPERTIES; NANOINDENTATION; REACTIVE ION ETCHING; SHEAR FLOW; SILICA; STRAIN HARDENING;

FUSED SILICA;

EID: 79952396264     PISSN: 19414900     EISSN: 19414919     Source Type: Journal    
DOI: 10.1166/nnl.2010.1105     Document Type: Article

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