Plasma etching: From micro- to nanoelectronics

High Energy Chemistry

Volumn 43, Issue 3, 2009, Pages 204-212

  Shamiryan, D ^a   Paraschiv, V ^a   Boullart, W ^a   Baklanov, M R ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 67650346260     PISSN: 00181439     EISSN: 16083148     Source Type: Journal    
DOI: 10.1134/S0018143909030084     Document Type: Article

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