Nano-depth grooves formed through O2 plasma etching in the presence of PTFE

Journal of Micromechanics and Microengineering

Volumn 19, Issue 11, 2009, Pages

  Misawa, Nobuo ^a,b   Takeuchi, Shoji ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING CHAMBER; ETCHING RATE; FLUIDIC CHANNELS; GLASS SURFACES; OUTPUT POWER; PLASMA EQUIPMENTS; ROOT MEAN SQUARE ROUGHNESS; SILICON SUBSTRATES; SIMPLE METHOD; SURFACE AREA;

ATOMIC FORCE MICROSCOPY; FLUIDIC DEVICES; PHOTORESISTS; PLASMA ETCHING; PLASMAS;

GLASS;

EID: 70350647353     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/11/115032     Document Type: Article

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