SCOPUS 정보 검색 플랫폼

Volumn 48, Issue 12, 2009, Pages

Silicon nitride nanopillars and nanocones formed by nickel nanoclusters and inductively coupled plasma etching for solar cell application

(6) Sahoo, Kartika Chandra a Lin, Men Ku a,b Chang, Edward Yi a Tinh, Tran Binh a Li, Yiming a Huang, Jin Hua a,b

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL TSING HUA UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DOUBLE-STEP; ETCHING TIME; EXTERNAL QUANTUM EFFICIENCY; FORMATION MECHANISM; ICP ETCHING; ION ETCHING; NANO-CONES; NANOCONE; NANOCONE STRUCTURES; NANOPILLAR; NANOPILLARS; NICKEL-NANOCLUSTERS; REFLECTANCE SPECTRUM; SELF-ASSEMBLED; SINGLE-STEP; SOLAR-CELL APPLICATIONS; SUB-WAVELENGTH; TEXTURED SURFACE;

NANOCLUSTERS; NICKEL ALLOYS; PLASMA ETCHING; REFLECTION; SILICON NITRIDE; SOLAR CELLS;

INDUCTIVELY COUPLED PLASMA;

EID: 75149187832 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.126508 Document Type: Article

Times cited : (25)

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