Electron field emission from silicon nanowires

Applied Physics Letters

Volumn 75, Issue 12, 1999, Pages 1700-1702

  Au, Frederick C K ^a   Wong, K W ^a   Tang, Y H ^a   Zhang, Y F ^a   Bello, I ^a   Lee, S T ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; HYDROGEN; LASER ABLATION; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; POWDERS; SILICON WAFERS; SYNTHESIS (CHEMICAL); VOLTAGE MEASUREMENT;

FOWLER-NORDHEIM EQUATION; NANOWIRES;

SEMICONDUCTING FILMS;

EID: 0032606855     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124794     Document Type: Article

References (15)

1. S. Iijima, Nature (London) 354, 56 (1991).
2. A. M. Morales and C. M. Lieber, Science 279, 208 (1998).
3. W. Man, S. Fan, Q. Li, B. Gu, X. Zhang, and D. Yu, Appl. Phys. Lett. 77, 2271 (1997).
4. D. P. Yu, X. S. Sun, C. S. Lee, I. Bello, S. T. Lee, H. D. Gu, K. M. Leung, G. W. Zhou, Z. F. Dong, and Z. Zhang, Appl. Phys. Lett. 72, 1966 (1998).
5. J. L. Liu, Y. Lu, Y. Shi, S. L. Gu, R. L. Jiang, F. Wang, and Y. D. Zheng, Appl. Phys. A: Mater. Sci. Process. 66, 539 (1998).
6. J-M Bonard, J-P Salvetat, T. Stöcki, W. A. de Heer, L. Forró, and A. Châtelain, Appl. Phys. Lett. 73, 918 (1998).
7. Q. H. Wang, T. D. Corrigan, J. Y. Dai, R. P. H. Chang, and A. R. Krauss, Appl. Phys. Lett. 70, 3308 (1997).
8. Q. H. Wang, A. A. Setlur, J. M. Lauerhaas, J. Y. Dai, E. W. Seelig, and R. P. H. Chang, Appl. Phys. Lett. 72, 2912 (1998).
9. Y. F. Zhang, Y. H. Tang, N. Wang, D. P. Yu, C. S. Lee, I. Bello, and S. T. Lee, Appl. Phys. Lett. 72, 1835 (1998).
10. W. Zhu, G. P. Kochanski, S. Jin, L. Seibles, D. C. Jacobson, M. McCormack, and A. E. White, Appl. Phys. Lett. 67, 1157 (1995).
11. F. Y. Chuang, C. Y. Sun, H. F. Cheng, and I. N Lin, Appl. Phys. Lett. 70, 2111 (1997).
12. E. J. Chi, J. Y. Shim, H. K. Baik, and S. M. Lee, Appl. Phys. Lett. 71, 324 (1997).
13. T. Sugino, S. Kawasaki, K. Tanioka, and J. Shirafuji, Appl. Phys. Lett. 71, 2704 (1997).
14. R. H. Fowler and L. W. Nordheim, Proc. R. Soc. London, Ser. A 119, 173 (1928).
15. W. Zhu, G. P. Kochanski, S. Jin, and L. Seibles, J. Vac. Sci. Technol. B 14, 2011 (1996).