Nanopillar ITO electrodes via argon plasma etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 4, 2012, Pages

  Van Dijken, Jaron G ^a   Brett, Michael J ^a,b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AR PLASMAS; ARGON PLASMA ETCHING; COLUMNAR MORPHOLOGY; ELECTRICAL CONDUCTIVITY; FORMING GAS; INDIUM TIN OXIDE; ITO ELECTRODES; ITO FILMS; NANOPILLAR; NANOPILLARS; ORGANIC SOLAR CELL; VERTICALLY ALIGNED;

ARGON; ASPECT RATIO; ELECTRIC CONDUCTIVITY; OPACITY; PLASMA ETCHING; TIN; TIN OXIDES;

NANOSTRUCTURES;

EID: 84863673524     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4729592     Document Type: Article

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