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Volumn 19, Issue 45, 2008, Pages

Fabrication of sub-25 nm diameter pillar nanoimprint molds with smooth sidewalls using self-perfection by liquefaction and reactive ion etching

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; ETCHING; LIQUEFACTION; MOLDS; NANOIMPRINT LITHOGRAPHY; PLANTS (BOTANY); SILICON COMPOUNDS;

EID: 58149240175     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/45/455301     Document Type: Article
Times cited : (16)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.