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Volumn 19, Issue 45, 2008, Pages
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Fabrication of sub-25 nm diameter pillar nanoimprint molds with smooth sidewalls using self-perfection by liquefaction and reactive ion etching
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Author keywords
[No Author keywords available]
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Indexed keywords
CHROMIUM;
ETCHING;
LIQUEFACTION;
MOLDS;
NANOIMPRINT LITHOGRAPHY;
PLANTS (BOTANY);
SILICON COMPOUNDS;
CYLINDRICAL SHAPES;
DOT ARRAYS;
NANOIMPRINT MOLDS;
PILLAR ARRAYS;
REACTIVE IONS;
SIDE-WALLS;
SMALL DIAMETERS;
REACTIVE ION ETCHING;
CHROMIUM;
ION;
NANOMATERIAL;
QUANTUM DOT;
SILICON;
SILICON DIOXIDE;
ARTICLE;
ATOM;
CHEMICAL REACTION;
LIQUEFACTION;
NANOARRAY;
NANOFABRICATION;
PRIORITY JOURNAL;
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EID: 58149240175
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/19/45/455301 Document Type: Article |
Times cited : (16)
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References (11)
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