Smooth and high-rate reactive ion etching of diamond

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 824-827

  Ando, Yutaka ^a   Nishibayashi, Yoshiki ^a   Kobashi, Koji ^a   Hirao, Takashi ^a   Oura, Kenjiro ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Anisotropic etching; Columnar structure; Field emission; Reactive ion etching

Indexed keywords

ALUMINUM; ANISOTROPY; MASKS; REACTIVE ION ETCHING; SURFACE CHEMISTRY; SURFACE ROUGHNESS;

ANISOTROPIC ETCHING;

SEMICONDUCTING DIAMONDS;

DIAMOND; ETCHING; INDUSTRIAL APPLICATION; SEMICONDUCTOR; THERMAL CONDUCTIVITY;

EID: 0036508303     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00617-3     Document Type: Article

References (9)