Patterning of highly oriented pyrolytic graphite and glassy carbon surfaces by nanolithography and oxygen plasma etching

Carbon

Volumn 47, Issue 5, 2009, Pages 1335-1342

  Fredriksson, H ^a   Chakarov, D ^a   Kasemo, B ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GRAPHITE; MASKS; NANOSTRUCTURES; OPTICAL MICROSCOPY; OXYGEN; PLASMA ETCHING; PLASMAS; SCANNING ELECTRON MICROSCOPY; SURFACES;

ATOMIC FORCES; BASAL SURFACES; CARBON SURFACES; COLLOIDAL LITHOGRAPHIES; ETCH MASKS; ETCH RATES; GEOMETRICAL PROPERTIES; GLASSY CARBON SURFACES; GLASSY CARBONS; HIGHLY ORIENTED PYROLYTIC GRAPHITES; ISOTROPIC ETCHINGS; LATERAL DIRECTIONS; MASK PATTERNS; NANO-STRUCTURING; NANOPILLARS; OPTICAL CHARACTERIZATIONS; OPTICAL SPECTROPHOTOMETRIES; OXYGEN PLASMA ETCHINGS; OXYGEN PLASMAS; PLASMA CONDITIONS; REACTIVE IONS; SURFACE REFLECTANCES; TWO-MATERIALS;

REACTIVE ION ETCHING;

EID: 61649108078     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2009.01.018     Document Type: Article

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